• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Materials in space environment >PLASMA-DEPOSITED COATINGS AND SURFACE FLUORINATION FOR PROTECTION OF SPACECRAFT MATERIALS AGAINST ATOMIC OXYGEN EROSION
【24h】

PLASMA-DEPOSITED COATINGS AND SURFACE FLUORINATION FOR PROTECTION OF SPACECRAFT MATERIALS AGAINST ATOMIC OXYGEN EROSION

机译：等离子体沉积的涂层和表面氟化技术，用于保护用于抗氧原子腐蚀的空间工艺材料

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

We report final results from Phase II (Technology Development) of a multi-year project on the protection of polymeric materials in the low Earth orbit (LEO) environment, which has been pursued under the Canadian Space Agency's STEAR 6 program. The approach that evolved from Phase I (Feasibility Study) consists of (a) a thin (< 0.5 μm) plasma enhanced chemical vapor deposited (PECVD) SiO_2 coating as the primary protection, together with (b) surface fluorinating the underlying polymer. This combined protection is applied to full-scale spacecraft components such as graphite-epoxy composite struts and Kapton~r thermal blankets. Pilot-scale PECVD reactors, capable of depositing uniform, defect-free SiO_2 coatings, have been developed to coat both types of components; for the case of the flexible substrate material, technology transfer to an existing 100 cm wide PECVD production roll-coater is unproblematic.
机译：我们报告了一项关于在低地球轨道（LEO）环境中保护聚合物材料的多年期项目第二阶段（技术开发）的最终结果，该项目已在加拿大航天局的STEAR 6计划下进行。从阶段I（可行性研究）发展而来的方法包括：（a）薄薄的（<0.5μm）等离子体增强化学气相沉积（PECVD）SiO_2涂层作为主要保护层，以及（b）表面氟化底层聚合物。这种综合保护措施适用于大型航天器部件，例如石墨-环氧树脂复合支柱和Kapton®热毯。已经开发出能够沉积均匀，无缺陷的SiO_2涂层的中试PECVD反应器，以涂覆两种类型的组件。对于柔性基板材料，将技术转移到现有的100厘米宽PECVD生产辊涂机是毫无问题的。

著录项

  • 来源
    《Materials in space environment》|1997年|393-402|共10页
  • 会议地点 Toulouse(FR)
  • 作者

    M.R. Wertheimer; G. Czeremuszkin; J. Cerny; J.E. Klemberg-Sapieha; L. Martinu; W. Kremers;

  • 作者单位

    NSERC Industrial Research Chair on Plasma Processing, Department of Engineering Physics, Ecole Polytechnique, Montreal, Qc H3C 3A7, Canada;

    Polyplasma Inc., Montreal, Qc H3T 1P1;

    NSERC Industrial Research Chair on Plasma Processing, Department of Engineering Physics, Ecole Polytechnique, Montreal, Qc H3C 3A7, Canada;

    NSERC Industrial Research Chair on Plasma Processing, Department of Engineering Physics, Ecole Polytechnique, Montreal, Qc H3C 3A7, Canada;

    NSERC Industrial Research Chair on Plasma Processing, Department of Engineering Physics, Ecole Polytechnique, Montreal, Qc H3C 3A7, Canada;

    AECL Whiteshell Research Laboratories, Pinawa, Man. ROE 1L0;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 航空用材料;地面设备、试验场、发射场、航天基地;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号