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首页> 外文会议>Conference on oxide-based materials and devices >Lattice location of Hf and its interaction with other impurities in LiNbO_3: an integrated review
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Lattice location of Hf and its interaction with other impurities in LiNbO_3: an integrated review

机译：Hf的晶格位置及其与LiNbO_3中其他杂质的相互作用：综述

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摘要

Lithium niobate, LiNbO_3, exists in a wide range of compositions, from congruent to stoichiometric. Undoped congruent LiNbO_3 suffers from a relatively low optical damage threshold which constitutes its major disadvantage for optoelectronic devices. The optical damage threshold is dependent on the amount of intrinsic defects, and is considerably increased in stoichiometric material and in congruent material doped with specific impurities, such as Mg, In, Sc and Zn. It has been recently shown that doping with Hf leads to a significant increase of the photorefractive resistance at a threshold concentration of about 3 mol%. The study of the lattice location of Hf in LiNbO_3 and its interaction with other impurities and intrinsic defects had started more than a decade before the discovery of the role of this impurity, as Hf was a convenient probe for combined studies using the nuclear techniques Perturbed Angular Correlations and Rutherford Backscattering Spectrometry/Channeling. An integrated review of the main results obtained with these techniques is presented.
机译：铌酸锂LiNbO_3的组成范围很广，从全量到化学计量。未掺杂的全同LiNbO_3具有相对较低的光学损伤阈值，这构成了其对光电器件的主要缺点。光学损伤阈值取决于固有缺陷的数量，并且在化学计量材料和掺杂有特定杂质（例如Mg，In，Sc和Zn）的全同材料中显着提高。最近已经表明，在约3mol％的阈值浓度下，用Hf掺杂导致光致折光电阻的显着增加。在发现这种杂质的作用之前，已开始研究Hf在LiNbO_3中的晶格位置及其与其他杂质和固有缺陷的相互作用，因为Hf是使用核技术“扰动角”进行组合研究的便捷探针相关性和卢瑟福背散射光谱/通道。介绍了使用这些技术获得的主要结果的综合综述。

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