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2D Photonic Crystal Patterning for High Volume LED Manufacturing

机译:2D光子晶体图案化适用于大容量LED制造

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Due to their small dimensions when used for visible light, the patterning of photonic crystals has only been possible with costly electron beam lithography and low throughput R&D and pilot production grade imprint lithography. This paper will focus on results from a high throughput imprint tool capable of processing over 20 wafers per hour on 50-100mm sapphire, GaAs, SiC, Ge and metal substrates. An overview of the process used as well as the results of patterning photonic crystal patterns on sapphire wafers and etching them into a SiO2 hard mask will be presented. Finally an analysis of the cost of ownership which currently stands at ~
机译:由于它们的尺寸小用于可见光时,光子晶体的图案化仅具有昂贵的电子束光刻和低通量研发和试验级印记光刻。本文将专注于高吞吐量印记工具的结果,该工具能够在50-100mm蓝宝石,GaAs,SiC,GE和金属基板上加工每小时20多个晶圆。将概述使用的过程以及在蓝宝石晶片上进行图案化光子晶体图案的结果并将其蚀刻成SiO2硬掩模。最后分析目前代表〜的所有权成本

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