Reticle defect sizing of optical proximity correction defects using SeM imaging and image analysis techniques

机译：使用SEM成像和图像分析技术光阑近距离校正缺陷的掩模版缺陷尺寸

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Sizing of programmed defects on optical proximity correctioon (OPC) features is addressed usin ghigh resolution scanning electron microscope (SEM) images and image analysis techniques. A comparison and analysis of different sizing methods is made. This paper addresses the issues of OPC defect definition and discusses the experimental measurement results obtained by SEM in combination with image analysis techniques.

机译：在光学接近校正器（OPC）特征上的编程缺陷的尺寸是解决了USIN GHIGH分辨率扫描电子显微镜（SEM）图像和图像分析技术。不同施胶方法的比较与分析。本文解决了OPC缺陷定义的问题，并讨论了SEM与图像分析技术相结合获得的实验测量结果。

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《Conference on photomask and next-generation lithography mask technology》|2000年||共8页
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Larry Zurbrick; Lantian Wang; Paul Konicek; Ellen Laird; SPIE-The International Society for Optical Engineering;
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正文语种
中图分类摄影机具与设备;
关键词
OPC; defect measurement; defect printability;

机译：OPC;缺陷测量;缺陷可印刷性;

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2. Proximity gettering technique using CH_3O multielement molecular ion implantation for the reduction of the white spot defect density in CMOS image sensor [J] . Hirose Ryo, Kadono Takeshi, Okuyama Ryosuke, Japanese journal of applied physics . 2019,第9期

机译：使用CH_3O多元素分子离子注入技术的接近吸收技术，可降低CMOS图像传感器中的白点缺陷密度
3. Corrigendum: 'Proximity gettering technique using CH_3O multielement molecular ion implantation for white spot defect density reduction in CMOS image sensor' [Jpn. J. Appl. Phys. 58, 091002 (2019)] [J] . Hirose Ryo, Kadono Takeshi, Okuyama Ryosuke, Japanese journal of applied physics . 2019,第10期

机译：逆变：'接近吸收技术使用CH_3O多元素分子离子注入，用于CMOS图像传感器的白色点缺陷密度降低[JPN。 J. Appl。物理。 58,091002（2019）]
4. Reticle defect sizing of optical proximity correction defects using SeM imaging and image analysis techniques [C] . Larry Zurbrick, Lantian Wang, Paul Konicek, Conference on photomask and next-generation lithography mask technology . 2000

机译：使用SeM成像和图像分析技术确定光学邻近校正缺陷的掩模版缺陷大小
5. Automated Defect Detection in Spent Nuclear Fuels in Wet Storage Using Machine Learning and Image Analysis Techniques [D] . Brayfindley, Evangelina. 2019

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6. Phenotyping the Microvasculature in Critical-Sized Calvarial Defects via Multimodal Optical Imaging [O] . Adam Mendez, Alexandra N. Rindone, Namrata Batra, -1

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7. Aerial image measurement technique for Automated Reticle Defect Disposition (ARDD) in wafer fabs [O] . A. M. Zibold, R. Schmid, B. Stegemann, 2008

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8. Direct defect imaging in the high resolution SEM (scanning electron microscope). [R] . Joy, D. C. 1990

机译：在高分辨率sEm（扫描电子显微镜）中直接缺陷成像。

Reticle defect sizing of optical proximity correction defects using SeM imaging and image analysis techniques

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