Advanced e-beam reticle writing system for next generation reticle fabrication

机译：下一代掩模版制造的先进电子束光纤写入系统

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In this paper, the key features and results of the new advanced electron beam (e-beam) reticle writing system HL-900M are shown. This new system, based on HL-800M technology~(1)-3)), has been improved from the both sides of hardware and software with introducing some new technologies. The new electron beam optical column has been introduced to keep enough stability against environmental fluctuations. X-Y stage mechanism and high precision temperature control system have been refreshed to promise highly positioning accuracy. Parallel processing exposure function maskes throughput improved even with handling the huge amount of data, such as over 20 Gbytes in the standard specification system.

机译：在本文中，示出了新的先进电子束（电子束）掩模版本系统HL-900M的关键特征和结果。基于HL-800M技术〜（1）-3）的新系统已从硬件和软件两侧提高，引入了一些新技术。已经引入了新的电子束光学柱以保持对环境波动的足够稳定性。 X-Y级机构和高精度温度控制系统已被刷新以承诺高度定位精度。并行处理曝光功能掩蔽了吞吐量，即使处理大量数据，例如标准规范系统中超过20 GBytes。

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《Conference on photomask and next-generation lithography mask technology》|2000年||共11页
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Tetsuji Nakahara; Kazui Mizuno; Suyo Asai; Yasuhiro Kadowaki; Katsuhiro Kawasaki; Hidetoshi Satoh; SPIE-The International Society for Optical Engineering;
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中图分类摄影机具与设备;
关键词
e-beam reticle writing system; 50kV electron gun; variable-shaped beam; vector scan; continuous moving stage; 0.18-0.15 mu m node reticle; parallel processing exposure function; temperature control system;

机译：电子束掩模版写入系统;50kV电子枪;可变形梁;矢量扫描;连续移动阶段;0.18-0.15 mu m节点掩模版;并行处理曝光功能;温度控制系统;

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4. Advanced e-beam reticle writing system for next generation reticle fabrication [C] . Tetsuji Nakahara, Kazui Mizuno, Suyo Asai, Conference on photomask and next-generation lithography mask technology . 2000

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Advanced e-beam reticle writing system for next generation reticle fabrication

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