Simulation Based Defect Printability Analysis on Attenuated Phase Shifting Masks

机译：仿真基于缺陷可印刷性分析衰减相移掩模

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Simulated wafer images for Attenuated Phase Shift Mask (ATTPSM) features are performed by the Virtual Stepper? System. The ATTPSM test reticles were prepared with programmed defects (hard defects and phase defects) on line/space patterns, contact hole patterns, and rectangle patterns for 150-nm design rules. Each defect area was inspected using KLA-Tencor's UV-HR365 and SLF27 inspection systems. Virtual Stepper simulations are compared with Aerial Image Measurement System (AIMS~(TM)) simulation at best focus and at multiple defocus levels. In addition, simulation accuracy from different inspection images is compared.

机译：用于减毒相移掩模（ATTPSM）功能的模拟晶片图像由虚拟步进器执行？系统。在线/空间图案，接触孔图案和150nm设计规则的线/空间图案，接触孔图案和矩形图案上制备ATPSM测试掩模。使用KLA-Tencor的UV-HR365和SLF27检测系统检查每个缺陷区域。将虚拟步进模拟与空中图像测量系统（AIMS〜（TM））模拟进行比较，并在最佳焦点和多个散焦水平上进行模拟。此外，比较了不同检查图像的模拟精度。

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《Conference on photomask and next-generation lithography mask technology》|2002年||共8页
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作者
Linyong Pang; Qi-De Qian; Kevin Chan; Nobuhito Toyama; Naoya Hayashi;
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原文格式 PDF
正文语种
中图分类光刻、掩膜;
关键词
attenuated PSM; halftone mask; defect inspection; defect printability;

机译：减毒PSM;半色调面膜;缺陷检查;缺陷可印刷性;

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专利

1. Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability [J] . Tsuneo Terasawa, Yukiyasu Arisawa, Tsuyoshi Amano, Japanese journal of applied physics . 2013,第9issue1期

机译：用于观察极紫外光刻掩模以预测相缺陷可印刷性的高倍成像光学元件特性的模拟分析
2. Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach [J] . Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Journal of microanolithography, MEMS, and MOEMS . 2015,第2期

机译：通过建模和仿真方法评估掩埋的原生极紫外掩膜相缺陷的可印刷性
3. Simulation of Applications of High-Transmittance Embedded Layer in Transmittance Control Mask and Optimization of Attenuated Phase-Shifting Mask by Design of Experiment [J] . Kwei-tin Yeh, Hsien-yun Lin, Wen-an Loong Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2007,第1期

机译：高透射率嵌入层在透射率控制掩模中的应用仿真及衰减相移掩模的优化设计
4. Simulation Based Defect Printability Analysis on Attenuated Phase Shifting Masks [C] . Linyong Pang, Qi-De Qian, Kevin Chan, Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan . 2002

机译：基于仿真的衰减相移掩模缺陷可印性分析
5. Fabrication, simulation, and demonstration of X-ray phase-shifting masks for sub-70 nanometer devices construction. [D] . Yang, Lei. 2001

机译：用于低于70纳米的器件构造的X射线相移掩模的制造，仿真和演示。
6. Research on a Defects Detection Method in the Ferrite Phase Shifter Cementing Process Based on a Multi-Sensor Prognostic and Health Management (PHM) System [O] . Bo Wan, Guicui Fu, Yanruoyue Li, 2016

机译：基于多传感器预测与健康管理（PHM）系统的铁素体移相器固井工艺缺陷检测方法研究
7. Simulation and fabrication of attenuated phase-shifting masks: CrF_x [O] . Kim, E., Hong, S., Kim, K-S, 1997

机译：衰减相移掩模的仿真与制造：CrF_x

Simulation Based Defect Printability Analysis on Attenuated Phase Shifting Masks

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