Phase assignment for bright field of dense contact

机译：相位分配的密集接触领域

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摘要

There is a simple algorithm to translate the dense contacts of a regular design into a well assigned two phases in this paper. Some of its basic variant applications and a procedure to detect the phase assignment errors for the whole chip layer to insure the whole chip phase assignment success are also included. The variant applications include to add the assist features and assign the phases between the main features and the assist features and the post rule bias consideration. This executable environment makes the alternating PSM easy to be applied in the bright field of the dense contact.

机译：有一种简单的算法将常规设计的密集触点转换为本文中的良好分配的两个阶段。还包括一些基本变体应用程序和用于检测整个芯片层的相位分配误差以确保整个芯片相位分配成功的过程。变体应用程序包括添加辅助功能，并在主要功能和辅助功能之间分配阶段和后期规则偏置考虑。该可执行环境使交替的PSM易于应用于密集接触的明亮场。

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《Conference on photomask and next-generation lithography mask technology》|2002年||共8页
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作者
Nail Tang;
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正文语种
中图分类光刻、掩膜;
关键词
PSM; alternating PSM; phase assignment; assist feature; scattering bar; OPC; hybrid OPC;

机译：PSM;交替的PSM;相位分配;辅助功能;散射栏;OPC;混合opc;

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1. Using the phase-space imager to analyze partially coherent imaging systems: Bright-field, phase contrast, differential interference contrast, differential phase contrast, and spiral phase contrast [J] . Mehta S.B., Sheppard C.J.R. Journal of Modern Optics . 2010,第9期

机译：使用相空间成像仪分析部分相干成像系统：明场，相位对比，差分干涉对比，差分相位对比和螺旋相位对比
2. Using the phase-space imager to analyze partially coherent imaging systems: bright-field, phase contrast, differential interference contrast, differential phase contrast, and spiral phase contrast [J] . Shalin B. Mehtaab* amp, Colin J.R. Sheppardabc Journal of Modern Optics . 2010,第9期

机译：使用相空间成像仪分析部分相干成像系统：明场，相位对比，差分干涉对比，差分相位对比和螺旋相位对比
3. Application of three-dimensional electron tomography using bright-field imaging—Two types of Si-phases in Al–Si alloy [J] . Science and technology of advanced materials . 2006,第7期

机译：亮场成像在三维电子层析成像中的应用——Al-Si合金中的两种硅相
4. Phase assignment for bright field of dense contact [C] . Nail Tang Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan . 2002

机译：密集接触的明场的相位分配
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6. Direct Imaging of Phase Objects Enables Conventional Deconvolution in Bright Field Light Microscopy [O] . Carmen Noemí Hernández Candia, Braulio Gutiérrez-Medina 2010

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7. Dissipation of magnetic fields in very dense interstellar clouds - II. Final phases of star formation and the magnetic flux of a newborn star [O] . T. Nakano, T. Umebayashi 1986

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Phase assignment for bright field of dense contact

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