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Hydraulic supports for polishing TMT M3MP

机译:液压支架,用于抛光TMT M3MP

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摘要

For polishing the ultra-thin TMT M3MP, a polishing support system with 18 hydraulic supports (HS) is introduced. This work focuses on the designing and testing of these HSs. Firstly the design concept of HS system is discussed; then mechanical implementation of the HS structure is carried out, with special consideration of fluid cycling, work pressurization and the weight component. Afterward the piping installation and the de-gas process for the working fluid are implemented. Pressurization and stiffness are well checked before system integration for the single HS unit. Finally the support system is integrated for the polishing process.
机译:为了抛光超薄TMT M3MP,引入了带有18个液压支架(HS)的抛光支架系统。这项工作的重点是这些HS的设计和测试。首先讨论了HS系统的设计思想;然后进行HS结构的机械实施,并特别考虑流体循环,工作压力和重量分量。之后,进行管道安装和工作流体的脱气处理。在对单个HS单元进行系统集成之前,对加压和刚度进行了很好的检查。最后,将支撑系统集成到抛光过程中。

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