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Making a photoresist relief hologram with expection groove depth

机译:制作具有预期凹槽深度的光刻胶浮雕全息图

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Abstract: The holographic information transferred from photoresist master to replica is the relief groove depth. Many properties of the replica are related to groove depth of master, so to control the groove depth of photoresist master is important. In this paper, a novel method is adopted to obtain the value of the phase modulation by measuring diffraction light intensity of the photoresist master, since there is a certain relationship between groove depth and phase modulation, so the groove depth can be obtained indirectly.!4
机译:摘要:从光刻胶原版转移到复制品的全息信息是浮雕槽深度。复制品的许多特性与母盘的凹槽深度有关,因此控制光刻胶母盘的凹槽深度很重要。在本文中,采用一种新颖的方法通过测量光刻胶原版的衍射光强度来获得相位调制的值,因为凹槽深度与相位调制之间存在一定的关系,所以可以间接获得凹槽深度。 4

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