A novel Alt-PSM structure: isn't this an embedded Atten-PSM

机译：一种新颖的Alt-PSM结构：这不是嵌入式Atten-PSM

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摘要

A novel mask structure for an alternating aperture phase shift mask (Alt-PSM) to cut mask cost is proposed. By a mask with structure of an embedded attenuating phase shift mask (Atten-PSM), an Alt-PSM for an isolated line formation can be well fabricated. Fine image quality is confirmed with optical image calculations. Moreover, concept of this novel mask is proved by a preliminary experiment. In conclusion, this novel mask can replace conventional Alt-PSM for logic devices, resulting in considerable cut of mask cost.

机译：提出了一种用于交替孔径相移掩模（Alt-PSM）的新型掩模结构，以降低掩模成本。通过具有嵌入式衰减相移掩模（Atten-PSM）的结构的掩模，可以很好地制造用于隔离线形成的Alt-PSM。光学图像计算可确认图像质量良好。此外，通过初步实验证明了这种新型口罩的概念。总之，这种新颖的掩模可以代替传统的逻辑器件Alt-PSM，从而大大降低了掩模成本。

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来源
《Conference on Photomask Technology; 20060919-22; Monterey,CA(US)》|2006年|P.63492Q.1-63492Q.8|共8页
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作者
S. Nakao; K. Hosono; S. Maejima; K. Narimatsu; T. Hanawa; K. Suko;
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中图分类光刻、掩膜;
关键词
alternating aperture phase shift mask; embedded attenuating phase shift mask structure; logic gate;

机译：交替孔径相移掩模;嵌入式衰减相移掩模结构;逻辑门;

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A novel Alt-PSM structure: isn't this an embedded Atten-PSM

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