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首页> 外文会议>Conference on Photomask Technology; 20060919-22; Monterey,CA(US) >A new criterion of mask birefringence for polarized illumination
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A new criterion of mask birefringence for polarized illumination

机译：偏振照明掩模双折射的新判据

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摘要

We propose a new criterion for mask birefringence in polarized illumination. Mask birefringence is one of the critical properties of polarized illumination, because the illumination polarization is disturbed by the birefringence of a mask substrate. From this point of view, the allowable mask birefringence has already been analyzed. In these analyses, only the absolute values of birefringence have been specified. As has been pointed out, the mask is a rotation retarder for the polarized illumination. Therefore, the angle of the fast axis of mask birefringence also affects the state of polarization. The new criterion of mask birefringence which we propose here adopts the angle of fast axis as well as the absolute value of birefringence. This new criterion correlates well with the printed critical dimensions (CDs). To demonstrate this, printed CDs were calculated as a function of birefringence. A lithography simulator was used to verify the fit of the new criterion. In this simulation, experimentally measured absolute values of birefringence and the angle of fast axis were used. The simulation showed that there was poor correlation between printed CDs and the absolute values of birefringence. On the other hand, the new criterion exhibited a good correlation with the printed CDs. This difference is attributed to the effect of the angle of fast axis.
机译：我们为偏振照明中的掩模双折射提出了一个新的标准。掩模双折射是偏振照明的关键特性之一，因为照明偏振会受到掩模基板的双折射的干扰。从这一观点出发，已经对允许的掩模双折射进行了分析。在这些分析中，仅指定了双折射的绝对值。如已经指出的，掩模是用于偏振照明的旋转延迟器。因此，掩模双折射快轴的角度也影响偏振状态。我们在此提出的掩模双折射新标准采用快轴角度以及双折射的绝对值。此新标准与印刷的关键尺寸（CD）紧密相关。为了证明这一点，将印刷的CD计算为双折射的函数。使用光刻模拟器来验证新标准的适合性。在此仿真中，使用了实验测量的双折射绝对值和快轴角度。模拟表明，印刷的CD与双折射的绝对值之间的相关性很差。另一方面，新标准显示出与印刷CD的良好相关性。这种差异归因于快轴角度的影响。

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