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首页> 外文会议>Conference on Advanced Optical and Mechanical Technologies in Telescopes and Instrumentation >Near-infrared bandpass filters with improved transparency for 1000nm spectral region, using sputtered silicon compound films
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Near-infrared bandpass filters with improved transparency for 1000nm spectral region, using sputtered silicon compound films

机译：使用溅射的硅化合物薄膜的近红外带通滤光片在1000nm光谱区域具有更高的透明度

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Near-infrared bandpass filters are commonly designed & manufactured using vacuum-evaporated films of Silicon and Silicon Monoxide. However the transparency of these filters is limited by optical absorption in the films when producing filters for wavelengths below 1200nm approximately. This work reports improvements in NIR filter transparency achieved by exploiting recent advances in magnetron sputtering technology.Sputtered silicon compound films have been used to demonstrate efficient bandpass filters for astronomy applications at wavelengths below 1000nm. This process technology allows a new selection of film materials to be used in design of NIR bandpass filters, with transmission and thermal drift characteristics which differ from conventional evaporated coatings. The spectral location of the bandpass is controlled by a non-optical method, which avoids the complex optical monitoring configurations normally required. The speed and flexibility of this process also offers a potential solution for projects which require small batches of custom NIR optical filters.Highly durable filters are obtained without elevated process temperature, which would otherwise be required in conventional evaporation processes. This avoids heating filter substrates which may be sensitive to thermal cycling effects.Attenuation of sidebands to T<0.0001 is reported across the spectral range of common sensor devices. The thermal sensitivity for cryostat applications is characterised and compared to conventional evaporated optical coatings. This method has been applied to 975nm & 985nm bandpass filters for use on VISTA project instrumentation. It also offers improvements for filters at longer wavelengths in the range 1000nm-5000nm. Some examples are reported in this region.
机译：通常使用硅和一氧化硅的真空蒸发膜来设计和制造近红外带通滤光片。但是，当生产波长在1200nm以下的滤光片时，这些滤光片的透明度受到薄膜中光吸收的限制。这项工作报告了通过利用磁控溅射技术的最新进展而实现的近红外滤光片透明度的改善。 溅射硅化合物薄膜已被用于演示在波长低于1000nm的天文学应用中有效的带通滤光片。该工艺技术允许在NIR带通滤光片的设计中使用新的薄膜材料，其透射和热漂移特性与传统的蒸发涂层不同。带通的光谱位置是通过非光学方法控制的，从而避免了通常需要的复杂光学监视配置。此过程的速度和灵活性也为需要少量定制NIR光学滤镜的项目提供了潜在的解决方案。 在没有升高的过程温度的情况下获得了高度耐用的过滤器，而这在常规蒸发过程中是不需要的。这避免了加热过滤器基板，该基板可能对热循环效应敏感。 据报道，在整个传感器设备的光谱范围内，边带衰减至T <0.0001。表征了低温恒温器应用的热敏感性，并将其与传统的蒸发光学涂层进行了比较。此方法已应用于975nm和985nm带通滤光片，用于VISTA项目仪器。它还为波长范围在1000nm-5000nm的滤光片提供了改进。在该地区报道了一些例子。

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