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Evidence for charge gain mechanism in SI-GaAs detectors with epitaxial junction

机译:具有外延交界处的Si-GaAs探测器的充电增益机制的证据

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We made a characterisation of GaAs detectors with an epitaxial p-type layer deposited on the 200μm semi-insulating substrate. The charge collection efficiency for 60-keV photons and 5.49 MeV alpha particle depends on the doping level of the p-layer. When completely depleted (reverse bias > 200-300 V), the collected charge can be greater than 100%, implying the presence of some charge gain mechanism. At the same reverse bias and doping concentration, the collected charge depends also on the size of the contact pad. Moreover, the lower the p-doping, the lower the current density. The present findings confirm our previous work, obtaining gains up to 4:1.
机译:我们对GaAs探测器进行了表征,其外延p型层沉积在200μm半绝缘基板上。 60-keV光子和5.49mEVα粒子的电荷收集效率取决于p层的掺杂水平。当完全耗尽时(反向偏见> 200-300V),所收集的电荷可以大于100%,暗示存在一些电荷增益机制。在相同的反向偏置和掺杂浓度下,收集的电荷也取决于接触垫的尺寸。而且,P掺杂越低,电流密度越低。目前的调查结果确认了我们以前的工作,获得最高可达4:1的收益。

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