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Post-thermal annealing effects on the optical, structural and morphological properties of hydrogenated silicon (Si:H) thin films prepared by layer-by-layer (LBL) deposition technique

机译：后热退火对通过逐层（LBL）沉积技术制备的氢化硅（Si：H）薄膜的光学，结构和形态特性的影响

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《Semiconductor Electronics (ICSE), 2008 IEEE International Conference on》||P.643-648|共6页
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Goh Boon Tong; Chong Cheong Yow; Chong Su Kong; Abdul Gani Siti Meriam; Muhamad Muhamad Rasat; Rahman Saadah Abdul;
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专利

1. Optical properties of annealed Si:H thin film prepared by layer-by-layer (LBL) deposition technique [J] . Tong G.B., Muhamad M.R., Rahman S.A. Physica, B. Condensed Matter . 2010,第23期

机译：通过逐层（LBL）沉积技术制备的退火Si：H薄膜的光学特性
2. Effects of substrate temperature on structural, optical and morphological properties of hydrogenated nanocrystalline silicon thin films prepared by inductively coupled plasma chemical vapor deposition [J] . Dingyu Yang, Xinghua Zhu, Hui Sun, Journal of materials science . 2015,第10期

机译：衬底温度对电感耦合等离子体化学气相沉积法制备的氢化纳米晶硅薄膜结构，光学和形态性能的影响
3. Hydrogenated amorphous silicon-carbide thin films with high photo-sensitivity prepared by layer-by-layer hydrogen annealing technique [J] . S.X. Li, Y.Q. Cao, J. Xu, Applied Surface Science . 2013,第apra1期

机译：层状氢退火技术制备的高感光度氢化非晶碳化硅薄膜
4. Post-thermal annealing effects on the optical, structural and morphological properties of hydrogenated silicon (Si:H) thin films prepared by layer-by-layer (LBL) deposition technique [C] . Goh Boon Tong, Chong Cheong Yow, Chong Su Kong, IEEE International Conference on Semiconductor Electronics . 2008

机译：热退火对通过层（LBL）沉积技术制备的氢化硅（Si：H）薄膜的光学，结构和形态学性能的影响
5. THE EFFECT OF DEPOSITION CONDITIONS ON THE STRUCTURAL, OPTOELECTRONIC AND DEVICE PROPERTIES OF HYDROGENATED AMORPHOUS SILICON AND SILICON-GERMANIUM ALLOYS (SOLAR CELL, THIN FILM TRANSISTORS). [D] . YAN, PHILIP YU. 1987

机译：沉积条件对氢化非晶硅和硅锗合金（太阳能电池，薄膜晶体管）的结构，光电和器件性能的影响。
6. Effects of Rapid Thermal Annealing on the Structural Electrical and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition [O] . Jingjin Wu, Yinchao Zhao, Ce Zhou Zhao, 2016

机译：快速热退火对原子层沉积生长Zr掺杂ZnO薄膜的结构电学和光学性质的影响
7. Optical constants and electronic transition in hydrogenated silicon (Si:H) thin films deposited by layer-by-layer (LBL) deposition technique [O] . Goh Boon Tong, Muhamad Rasat Muhamad, Saadah Abdul Rahman 2011

机译：通过逐层（LBL）沉积技术沉积的氢化硅（Si：H）薄膜中的光学常数和电子跃迁

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