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Zero-defect sputter deposition metallization method for high-volume manufacturing of grafted multilayer thin film modules

机译：零缺陷溅射沉积金属化方法，用于嫁接多层薄膜模块的高批量生产

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The implementation of constant-power power supplies communicating with a magnet control system has been demonstrated to be an optimum way to uniformly deposit metal from an inline sputter system. This is an inline DC magnetron sputter deposition process. High equipment reliability (99% uptime), low defect levels (4 p.p.m.), and the use of 12-mm-thick targets for metallizing 3000 ft/sup 2/ of substrate area between cathode changes have been achieved. The system is configured to provide layered metal systems with discrete or phased interfaces. Plasma optimization via real-time magnetron control and magnetic field suppression at the beginning of the target life has enabled deposit thickness (and sheet resistivity) variation to be automatically controlled to +or-5% over the 435-in/sup 2/ deposition area throughout the life of the targets.

机译：已经证明了与磁体控制系统通信的恒功率电源的实现是从内联溅射系统均匀沉积金属的最佳方式。这是一个内联的DC磁控溅射沉积过程。高设备可靠性（<99％正常运行时间），低缺陷水平（> 4 p.M.），并且已经实现了使用12mm厚的用于金属化3000ft / sup 2 /在阴极变化之间的衬底区域的目标。该系统被配置为提供具有离散或相控界面的分层金属系统。通过实时磁控管控制和目标寿命开始的磁场抑制等离子体优化使得在435英寸/ SUP 2 /沉积区域上会使沉积物厚度（和薄层电阻率）变化自动控制到+或-5％整个目标的生活中。

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《Electronic Components and Technology Conference》|1992年||共6页
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Swirbel T.; Institute of Electric and Electronic Engineer;
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中图分类自动化技术、计算机技术;
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专利

1. Zero-defect sputter deposition metallization method for high volume manufacturing of grafted multilayer thin film modules [J] . Swirbel T. IEEE Transactions on Components, Hybrids, and Manufacturing Technology . 1993,第1期

机译：用于批量生产接枝多层薄膜组件的零缺陷溅射沉积金属化方法
2. Sputtering Deposition of Sandwich-Structured V2O5/Metal (V, W)/V2O5 Multilayers for the Preparation of High-Performance Thermally Sensitive VO2 Thin Films with Selectivity of VO2 (B) and VO2 (M) Polymorph [J] . Liu Hengwu, Wan Dongyun, Ishaq Ahmad, ACS applied materials & interfaces . 2016,第12期

机译：夹层结构的V2O5 /金属（V，W）/ V2O5多层膜的溅射沉积，用于制备具有VO2（B）和VO2（M）多晶型选择性的高性能热敏VO2薄膜
3. MOLYBDENUM TRIOXIDE THIN FILMS DOPED WITH GOLD NANOPARTICLES GROWN BY A SEQUENTIAL METHODOLOGY: PHOTOCHEMICAL METAL-ORGANIC DEPOSITION (PMOD) AND DC-MAGNETRON SPUTTERING [J] . CASTILLO C, BUONO-CORE G, MANZUR C, Journal of the Chilean Chemical Society . 2016,第1期

机译：序贯方法掺杂有金纳米颗粒的三氧化钼薄膜：光化学金属有机沉积（PMOD）和直流磁控溅射
4. Zero-defect sputter deposition metallization method for high-volume manufacturing of grafted multilayer thin film modules [C] . Swirbel, T. Electronic Components and Technology Conference, 1992. Proceedings., 42nd . 1992

机译：大规模生产接枝多层薄膜组件的零缺陷溅射沉积金属化方法
5. Layer-by-layer deposition of grafted PHEMA-g-PAA/PAH polyelectrolyte multilayer films and lysozyme binding. [D] . Ma, Yiding. 2011

机译：接枝PHEMA-g-PAA / PAH聚电解质多层膜的逐层沉积和溶菌酶结合。
6. Investigation of Antireflection Nb2O5 Thin Films by the Sputtering Method under Different Deposition Parameters [O] . Kun-Neng Chen, Chao-Ming Hsu, Jing Liu, 2016

机译：不同沉积参数下溅射法制备Nb2O5减反射薄膜的研究
7. MOLYBDENUM TRIOXIDE THIN FILMS DOPED WITH GOLD NANOPARTICLES GROWN BY A SEQUENTIAL METHODOLOGY: PHOTOCHEMICAL METAL-ORGANIC DEPOSITION (PMOD) AND DC-MAGNETRON SPUTTERING [O] . C CASTILLO, G BUONO-CORE, C MANZUR, 2016

机译：掺杂有序列方法的金纳米颗粒掺杂的钼薄膜：光化学金属 - 有机沉积（PMOD）和DC-Magnetron溅射
8. Sputter deposition of ZnS:Mn/SrS:Ce multilayer stacks for use as white phosphor thin film electroluminscent panels [R] . Ruffner, J. A. , Tuenge, R. T. , Sun, S. S. 1995

机译：Zns：mn / srs：Ce多层叠层的溅射沉积用作白色磷光体薄膜电致发光面板

Zero-defect sputter deposition metallization method for high-volume manufacturing of grafted multilayer thin film modules

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