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首页> 外文会议>Conference on Advances in Resist Technology and Processing >Development of EUV resists in homogenous CO2 solutions using CO2 compatible salts (CCS): a kinetic view of dissolution of conventional resists in supercritical CO2
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Development of EUV resists in homogenous CO2 solutions using CO2 compatible salts (CCS): a kinetic view of dissolution of conventional resists in supercritical CO2

机译：使用CO2兼容盐（CCS）在均质CO2溶液中抗蚀剂的发展：超临界CO2中常规抗蚀剂溶解的动力学视图

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A novel method for the development of standard EUV photoresists in CO2 using CO2 compatible salts (CCS) is described and examined using a quartz crystal microbalance (QCM) technique in CO2. The fundamental steps of this development process are proposed to be 1) photoresist modification via CCS interaction with Bronsted acid groups in the resist; and 2) dissolution of the modified resist into CO2. Removal rates of non-exposed photoresist from the quartz crystal can be studied in real time under a variety of conditions to help elucidate the kinetics and mechanism of the CCS development process. A series of runs from 35 to 50 C at the same CO2 density showed a strong effect of temperature on the development rate. In the presence of a large excess of CCS, the kinetics of dissolution appear to be zero order. An Arrhenius plot generated by this data gave an activation energy of 79.0 kJ/mol. The zero order kinetics of dissolution was confirmed with a series of runs at various CCS concentration that showed insignificant rate effects. Dynamic flow of the CCS solution in the QCM cell gave ~50% increase in rate of resist removal relative to the standard conditions using static CCS solution. The indication from the three sets of QCM experiments described here is that dissolution of the CCS modified polymer is the slow step in CCS development.
机译：描述使用CO 2相容盐（CCS）在CO 2中开发CO 2中标准EUV光致抗蚀剂的新方法，并在CO 2中使用石英晶体微稳定（QCM）技术进行检查。该开发过程的基本步骤提出为1）光致抗蚀剂改性通过CCS与抗蚀剂中的支架酸基团的相互作用; 2）将改性抗蚀剂溶解到CO 2中。可以在各种条件下实时研究来自石英晶晶的非暴露的光致抗蚀剂的除去速率，以帮助阐明CCS开发过程的动力学和机制。在同一二氧化碳密度下35至50℃的一系列运行显示出对开发速率的强烈影响。在大量CC的存在下，溶解的动力学似乎是零阶。由该数据产生的Arrhenius图具有79.0 kJ / mol的激活能量。通过在各种CCS浓度下进行一系列次数，确认溶解的零顺序动力学，其各种CCS浓度显示出微不足道的率效应。 CCS溶液在QCM电池中的动态流动使得使用静态CCS溶液的标准条件使抗蚀剂去除率增加〜50％。这里描述的三组QCM实验的指示是CCS改性聚合物的溶解是CCS发育的缓慢。

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