HIGH RATE DEPOSITION OF DLC (DIAMOND LIKE CARBON) FILMS BY MICROWAVE DISCHARGE

机译：微波排放的DLC（金刚石等碳）膜的高速率沉积

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A microwave discharge system which gives a deposition rate of 100 A , and allows continuous operation for 8 hours or more for DLC is described.

机译：将沉积速率提供100a的微波放电系统，并允许用于DLC的连续操作8小时或更长时间。

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《International symposium on plasma chemistry》|1997年||共3页
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Y. Sakamoto; H. Saito; S. Tada; M. Oikawa;
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中图分类等离子体化学;
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1. Effect of the substrate bias on the Raman spectra and thermal stability of diamond-like carbon (DLC) and silicon-modified DLC films prepared by plasma-enhanced chemical vapour deposition (PECVD) [J] . Ogwu A.A., Maguire P.D., McLaughlin J.A., Journal of Physics, D. Applied Physics: A Europhysics Journal . 1999,第9期

机译：衬底偏压对通过等离子体增强化学气相沉积（PECVD）制备的类金刚石碳（DLC）和硅改性DLC膜的拉曼光谱和热稳定性的影响
2. Pulsed laser deposition and characterization of diamond like carbon (DLC) films on germanium, silicon and glass substrates [J] . Optoelectronics and Advanced Materials-Rapid Communications . 2009,第2009期

机译：在锗，硅和玻璃基板上进行脉冲激光沉积和类金刚石碳（DLC）膜的表征
3. Deposition of nanocrystalline diamond films on silicon nitride ceramic substrates using pulsed microwave discharges in Ar/H_2/CH_4 gas mixture [J] . P. Bruno, F. Benedic, A. Tallaire Diamond and Related Materials . 2005,第3a7期

机译：在Ar / H_2 / CH_4混合气体中使用脉冲微波放电在氮化硅陶瓷基板上沉积纳米晶金刚石膜
4. HIGH RATE DEPOSITION OF DLC (DIAMOND LIKE CARBON) FILMS BY MICROWAVE DISCHARGE [C] . Y. Sakamoto, H. Saito, S. Tada, International symposium on plasma chemistry . 1997

机译：微波排放的DLC（金刚石等碳）膜的高速率沉积
5. A study of diamond thin film and diamondlike carbon film deposition using electron cyclotron resonance microwave discharges. [D] . Kuo, Szu-Cherng. 1991

机译：利用电子回旋共振微波放电进行金刚石薄膜和类金刚石碳膜沉积的研究。
6. Morphological Transition in Diamond Thin-Films Induced by Boron in a Microwave Plasma Deposition Process [O] . Paul A. Baker, David R. Goodloe, Yogesh K. Vohra 2017

机译：微波等离子体沉积工艺中硼诱导金刚石薄膜的形貌转变
7. Deposition of diamond like carbon (DLC) and C-N films using ion beam assisted deposition (IBAD) technique and evaluation of their properties [O] . J Prabhjyot Pal, S C Patil, S B Ogale, 1994

机译：使用离子束辅助沉积（IBAD）技术及其性质的评估，沉积金刚石（DLC）和C-N薄膜
8. High growth rate homoepitaxial diamond film deposition at high temperatures by microwave plasma-assisted chemical vapor deposition [R] . 1997

机译：通过微波等离子体辅助化学气相沉积在高温下高生长率同质外延金刚石膜沉积

HIGH RATE DEPOSITION OF DLC (DIAMOND LIKE CARBON) FILMS BY MICROWAVE DISCHARGE

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