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Strip geometry light emitting diodes over pulsed lateral epitaxial overgrown GaN for solidstate white lighting

机译:剥离几何发光二极管在脉冲横向外延覆盖GaN中的脉冲白色照明

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The stripe geometry InGaN/GaN and InGaN/AlInGaN multiple quantum well light emitting diodes (LEDs) were fabricated using pulsed lateral epitaxial overgrowth and conventional GaN layers over sapphire. Material quality improvement due to overgrowth of GaN layer results in enhanced LED output power for broad area square geometry devices emitting at 430 nm. Using of stripe geometry edge emitting LEDs allows considerable reducing of the device differential resistance and improving of the output power density. The power enhancement and ease of thermal management makes the arrays of stripe geometry LEDs to be promising for high power applications.
机译:使用脉冲横向外延过度生长和在蓝宝石上,使用脉冲横向外延过度生长和传统GaN层制造条纹几何ingaN / GaN和IngaN / Alingan多量子阱发光二极管(LED)。由于GaN层的过度生长导致的材料质量改进导致增强的LED输出功率,用于在430nm处发射的宽面积正方形几何设备。使用条纹几何边缘发射LED允许相当大的降低器件差动电阻和提高输出功率密度。电力增强和易于热管理使条纹几何形状LED阵列对高功率应用有前途。

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