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SURFACE ANALYSIS SYSTEM BY VUV PHOTONS-STIMULATED DESORPTION

机译:VUV光子刺激解吸的表面分析系统

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We developed a novel surface analysis system using a vacuum ultraviolet (VUV) photons. When the VUV photons were irradiated on the material surface, surface desorption was stimulated. The desorbed species were analyzed by the mass analyzer. First, we studied the decomposition process excited by VUV excimer lamps. We found that the different photon energy resulted in the different time dependence of the fragment detection even if the contamination had similar chemical construction. It suggested that the tracing the decomposition process. We developed an analyzing system, called "photo-stimulated desorption mass spectrometer (PSD)". A broadband VUV radiation for surface desorption was obtained from the Ar plasma excited by a Q-SW Nd:YAG laser. We selected and scanned wavelength by a monochromator. The desorbed species were analyzed by the quadrupole mass analyzer. We scanned the VUV wavelength and obtained the mass data. This PSD system enables us to analyze without damage on the sample.
机译:我们使用真空紫外(VUV)光子开发了一种新型表面分析系统。当在材料表面照射VUV光子时,刺激表面解吸。通过质量分析仪分析解吸物种。首先,我们研究了VUV准分子灯激发的分解过程。我们发现,即使污染具有相似的化学结构,不同的光子能量也导致片段检测的不同时间依赖性。它建议追踪分解过程。我们开发了一种分析系统,称为“光刺激解吸质谱仪(PSD)”。从Q-SW ND:YAG激光激发的Ar等离子体获得用于表面解吸的宽带VUV辐射。我们选择并扫描了单色器的波长。通过四极杆质量分析仪分析解吸物种。我们扫描了VUV波长并获得了质量数据。此PSD系统使我们能够在没有损坏的情况下分析。

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