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Improved manufacturability by OPC based on defocus data

机译：基于Defocus数据的OPC提高了可制造性

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The paper describes the advantages of optical proximity correction (OPC) based on defocus data instead of best focus data. By additionally accepting asymmetric variations of the dimension of different patterns e.g. for an isolated line that can become wider than its nominal width this method can deliver structures much more robust against opens and shorts than in the standard OPC approach which is based on data taken at best process conditions. The differences of both OPC methods are compared based on simulations and checked against experimental data of characteristic IC patterns.
机译：本文介绍了基于散焦数据而不是最佳焦点数据的光学接近校正（OPC）的优点。通过另外接受不同图案的尺寸的不对称变化。对于孤立的线，可以变得宽于其标称宽度，这种方法可以提供比在最佳工艺条件所采取的数据的标准OPC方法中更强大的对抗开放和短路。基于模拟比较了两种OPC方法的差异，并检查了特征IC模式的实验数据。

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