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Investigation of the ion beam emission from a pulsed power plasma device

机译:脉冲功率等离子体装置的离子束发射研究

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Plasma Focus (PF) devices are well known as ion beam sources with characteristic energy among the hundreds of keV to tens of MeV. The information on ion beam energy, ion distribution and composition is essential from the viewpoint of understanding fundamental physics behind their production and acceleration and also their applications in various fields,such as surface properties modification, ion implantation, thin film deposition, semiconductor doping and ion assisted coating. An investigation from a low energy, 1.8 kJ 160 kA, Mather type plasma focus device operating with nitrogen using CR-39 detectors was conducted to study the emission of ions at different angular positions. Tracks on CR-39 detectors at different angular positions reveal the existence of angular ion anisotropy. The results obtained are comparable with the time integrated measurements using FC. Preliminary results of this work are presented.
机译:等离子体焦点(PF)器件是众所周知的,其中数百kev到几十MeV中具有特征能量的离子束源。从理解其生产和加速背后的基本物理以及它们在各种领域的应用,例如表面性质改性,离子注入,薄膜沉积,半导体掺杂和离子等方面,有关离子束能量,离子分布和组成的信息是必不可少的辅助涂层。使用CR-39探测器的低能量,1.8kJ160ka,Mather型等离子体聚焦装置的研究,使用CR-39检测器进行操作,以研究不同角度位置的离子的发射。不同角度位置的CR-39探测器上的轨道揭示了角离子各向异性的存在。获得的结果与使用FC的时间集成测量相当。提出了这项工作的初步结果。

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