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Effect of working pressure on the properties of Al_2O_3/MgF_2 HR coatings prepared by electron beam evaporation

机译:工作压力对通过电子束蒸发制备的Al_2O_3 / MgF_2 HR涂层性能的影响

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The effects of working pressure on the properties of 355nm Al_2O_3/MgF_2 HR coatings were investigated. A series of samples were deposited by electron beam evaporation using the same deposition process at different working pressure. Transmittance of the HR coatings was measured by Lambda 900 spectrometer. Structure of the samples had been characterized by X-ray diffraction (XRD).The stress was measured by viewing the substrate deformation before and after coatings deposition using an optical interferometer, the stress results range from 223MPa to 315MPa. Laser-induced damage threshold (LIDT)was measured by a 351 nm Nd:YAG laser with a pulse width of 7 ns, the LIDT results range from 2.69 J/cm~2 to 11.03 J/cm~2 with the working pressure changing. It was found that working pressure has important effects on the absorption, stress and LIDT of 355nm Al_2O_3/MgF_2 HR coatings. (351nm, 7ns).The working pressure was no clear effect on the crystalline structure of the HR coatings.
机译:研究了工作压力对355NM Al_2O_3 / MgF_2HR涂层性能的影响。通过在不同的工作压力下使用相同的沉积工艺通过电子束蒸发沉积一系列样品。通过Lambda 900光谱仪测量HR涂层的透射率。样品的结构特征在于X射线衍射(XRD)。通过使用光学干涉仪在涂层沉积之前和之后观察底物变形来测量应力,应力结果为223MPa至315MPa。通过351nm Nd:YAG激光测量激光诱导的损伤阈值(LIDT),脉冲宽度为7 ns,LIDT结果为2.69J / cm〜2至11.03J / cm〜2,工作压力变化。结果发现,工作压力对355nm Al_2O_3 / MgF_2HR涂层的吸收,应力和液体具有重要影响。 (351nm,7ns)。工作压力对HR涂层的晶体结构没有明显影响。

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