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Study on band gap and dispersion model of Al2O3 thin films with different oxygen flow rates by ion beam sputtering

机译:通过离子束溅射与不同氧气流速的Al2O3薄膜带隙和分散模型研究

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Six groups of single-layer Alumina (Al_2O_3) thin films with different oxygen flow ratewere prepared by ion beam sputtering. The oxygen flow rate changed from 0 sccm to 50 sccm withthe interval of 10 sccm. The transmission spectrum, reflection spectrum and ellipsometric reflectionspectrum of Al_2O_3 thin films were analyzed by cody-lorentz model inversion calculation. The surfaceroughness of six groups of samples was measured by white light interferometer. The effects ofoxygen flow on band gap, Urbach band-tail absorption, deposition rate, surface roughness,deposition rate of Al_2O_3 thin films were studied. The experimental results showed that oxygen flowdirectly affects the band gap, Urbach tail absorption, deposition rate, surface roughness anddeposition rate of Al_2O_3 thin films.
机译:六组单层氧化铝(AL_2O_3)薄膜,具有不同的氧气流速通过离子束溅射制备。氧气流量从0 SCCM变为50个SCCM10 sccm的间隔。传输频谱,反射谱和椭圆形反射通过Cody-Lorentz模型反转计算分析Al_2O_3薄膜的光谱。表面通过白光干涉仪测量六组样品的粗糙度。效果氧气流动带隙,Urbach带尾部吸收,沉积速率,表面粗糙度,研究了Al_2O_3薄膜的沉积速率。实验结果表明氧气流动直接影响带隙,Urbach尾部吸收,沉积速率,表面粗糙度和AL_2O_3薄膜的沉积速率。

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