首页> 外文会议>Annual Conference of the Chinese Society of Micro-Nano Technology >Lateral RF MEMS Switch Based on Surface Micromachining Process
【24h】

Lateral RF MEMS Switch Based on Surface Micromachining Process

机译:基于表面微机械加工过程的横向RF MEMS开关

获取原文

摘要

In this paper, a novel RF MEMS switch driven by combs with low insertion loss is presented. The developed SPST RF MEMS switch with a lateral resistive contact and gold structure layer on a silicon substrate has been fabricated by surface micromachining process. The RF performance of the switch indicates an insertion loss below 0.30 dB at 20 GHz, a return loss better than 20 dB and isolation greater than 30 dB. Good RF characteristics have been achieved by the large contact area and a lateral Au-to-Au resistive contact.
机译:本文介绍了由具有低插入损耗的梳子驱动的新型RF MEMS开关。通过表面微机械加工过程制造了具有侧向电阻触头和金结构层的开发的SPST RF MEMS开关。开关的RF性能指示在20GHz下0.30dB以下的插入损耗,返回损耗优于20dB,并且隔离大于30 dB。通过大的接触面积和横向Au-to-Au电阻接触实现了良好的RF特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号