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Enhancement of structural stiffness in MEMS structures

机译:MEMS结构中结构刚度的增强

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Many optical applications require smooth micromirror reflective surfaces with large radius of curvature. Usually when using surface micromachining technology and as a result of residual stress and stress gradient in thin films, the control of residual curvature is a difficult task. In this work, two engineering approaches were developed to enhance structural stiffness of micromirrors. 1) By integrating stiffening structures and thermal annealing. The stiffening structures consist of U-shaped profiles integrated with the mirror (dimension 200x300 μm~2). 2) By combining selective electroplating and flip-chip based technologies. Nickel was used as electroplated material with optimal stress values around ±10 MPa for layer thicknesses of about 10 μm. With the former approach, typical curvature radii of about 1.5 cm and 0.6 cm along mirror width and length were obtained, respectively. With the latter approach, an important improvement in the micromirror planarity and flatness was achieved with curvature radius up to 23 cm and roughness lower than 5 nm rms for typical 1000x1000 μm~2. micromirrors.
机译:许多光学应用需要具有大半径的曲率半径的光滑微镜反射表面。通常在使用表面微机械线技术并且由于薄膜中的残余应力和应力梯度而进行,残留曲率的控制是一项艰巨的任务。在这项工作中,开发了两种工程方法以提高微镜的结构刚度。 1)通过整合加强结构和热退火。加强结构由与镜子集成的U形轮廓(尺寸200x300μm〜2)组成。 2)通过组合选择性电镀和基于倒装芯片的技术。镍用作电镀材料,具有约10μm的层厚度约为±10 MPa的最佳应力值。通过前一种方法,分别获得沿镜子宽度和长度约1.5cm和0.6cm的典型曲率半径。通过后一种方法,曲率半径最重要的改进,曲率半径最高可达23cm,粗糙度低于5nm rms,对于典型的1000x1000μm〜2。微镜。

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