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EVALUATION OF THE GAP STATE DISTRIBUTION IN a-Si:H BY SCLC MEASUREMENTS

机译:SCLC测量评价A-Si:H中的间隙状态分布

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Den Boer's analysis of n~+-i-n~+ samples with different thicknesses gives information about states in different regions of the gap. For thin samples, the density of states obtained by analyzing the J-V data yields the overlapping region of mid gap states and conduction band tail states, which resides in the upper portion of the gap. For thick samples, the explored region is related with to the mid-gap density of states. With a high enough bias, the Fermi level can be swept into the upper part of the gap. We emphasise that in a good quality sample, even if it is a thin one, the den Boer approach to SCLC gives correct information about the density of states. This information comes from the states in a limited upper region of the gap, because of the low activation energy featured by thin samples.
机译:DEN BOER对具有不同厚度的N〜+ -I-N〜+样品的分析,提供了有关间隙不同区域的状态的信息。对于薄样本,通过分析J-V数据获得的状态的密度产生了中间隙状态和导电带尾态的重叠区域,其位于间隙的上部。对于厚的样品,探索区域与状态的中间隙密度有关。具有足够高的偏差,可以将费米水平扫入间隙的上部。我们强调,在一个很好的质量样本中,即使它是一个薄的样本,Den Boer对SCLC的方法也提供了关于状态密度的正确信息。由于薄样本特征的低激活能量,该信息来自间隙的有限上部区域的状态。

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