• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>International Conference on Synchrotron Radiation Instrumentation >Comprehensive Electron-optical Characterization of an X-ray Photoemission Electron Microscope
【24h】

Comprehensive Electron-optical Characterization of an X-ray Photoemission Electron Microscope

机译：X射线照相机电子显微镜的综合电子光学表征

获取原文
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Typically the performance of Photoemission Electron Microscopes (PEEM) is reported as one number, representative of a microscope's ultimate performance under an ideal set of conditions. Often a simple Rayleigh criterion is used which defines the spatial resolution approximately as the minimum distance of two still distinguishable features. However, the ability of an instrument to provide meaningful spectroscopic and microscopic information depends on the contrast loss of a pattern over a much wider range of spatial frequencies. For example, the chemical signature of one area on the sample can be contaminated from an adjacent area although both areas are still easily distinguishable in a microscopic image. We report here on a more comprehensive measurement of the PEEM-II instrument at beamline 7.3.1.1 at the Advanced Light Source (ALS) that examines the response of the instrument to a wide range of experimental conditions.
机译：通常，光曝光电子显微镜（PEEM）的性能被报告为一个数字，代表显微镜的最终性能在理想的条件下。通常使用简单的Rayleigh标准，其定义了大约两个仍有可区分特征的最小距离的空间分辨率。然而，仪器提供有意义的光谱和微观信息的能力取决于在更广泛的空间频率范围内模式的对比度损失。例如，样品上的一个区域的化学特征可以从相邻区域污染，尽管两个区域仍然在微观图像中仍然很容易区分。我们在此报告了在首席光源（ALS）的PEAM-II仪器上更全面的测量，在先进的光源（ALS），该仪器检查仪器对各种实验条件的响应。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号