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首页> 外文会议>International Conference on Industry, Information System and Material Engineering >Deposition of titanium nitride film on Mg-Li alloys by DC reactive magnetron sputtering
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Deposition of titanium nitride film on Mg-Li alloys by DC reactive magnetron sputtering

机译：用DC反应磁控溅射沉积氮化钛膜对Mg-Li合金的沉积

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A number of studies have shown that TiN film is correlated with corrosion resistance. In this study, we used a reactive direct current magnetron sputtering system to prepare TiN coating on Mg-Li alloys at low temperature. The intermediate TiN layer of thickness was about 1.6 μm from Ti target (99.99% purity). The structures of the resulting nanocatalysts were investigated, using X-ray diffraction analysis (XRD). The surface morphology of the coating was observed by Atomic Force Microscope (AFM). In the corrosive compare experiment the samples of Mg-Li alloys with and without titanium nitride film were put in solution with 5% NaCl respectively. We fund that the Mg-Li alloys with TiN coating has a lower rate of liberation of hydrogen, and the eroded surface morphology was examined by Scanning Electron Microscopy (SEM), it prove that the TiN deposition on the surface of Mg-Li alloys has improved the corrosion resistance performance.
机译：许多研究表明，锡膜与耐腐蚀性相关。在这项研究中，我们使用了反应性直流磁控溅射系统，在低温下在Mg-Li合金上制备锡涂层。中间锡层厚度约为1.6μm（纯度为99.99％）。研究了所得纳米催化剂的结构，使用X射线衍射分析（XRD）进行研究。用原子力显微镜（AFM）观察涂层的表面形态。在腐蚀性比较实验中，分别用5％NaCl溶液溶液中含有和不含氮化钛膜的Mg-Li合金样品。我们基于用锡涂层的Mg-Li合金具有较低的氢气速率，通过扫描电子显微镜（SEM）检查侵蚀的表面形态，证明了Mg-Li合金表面上的锡沉积改善了耐腐蚀性能。

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