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Magnetic properties of Co thin films evaporated under normal and oblique incidence

机译：正常和倾斜发病率下蒸发CO薄膜的磁性

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We have evaporated series of Co thin films under vacuum onto silicon and glass substrates at a perpendicular and oblique incidence. The thickness of the magnetic layer ranges from 20 to 400 nm. The static magnetic properties have been performed by means of magnetic force microscopy (M.F.M.) and Alternating Gradient Field Magnetometer (A.G.F.M.) techniques. The influence of the magnetic layer thickness and the deposition angle are studied. As results, it is found a decrease of the coercive field from 250 Oe, for t = 20 nm, to 95 Oe, for t = 400 nm. These H_c values for obliquely evaporated cobalt films are larger than those measured for cobalt films evaporated at normal incidence, found to be equal to a few Oe. It is also found a decrease of the anisotropy field, from 1.6 kOe for the 20 nm Co thick film to 0.95 kOe for the 200 nm Co thick film. Furthermore, an increase of these fields with the increase of the deposition angle is found, as well. The easy axis of the saturation magnetization lies in the film plane, irrespective of the substrate nature. The MFM observations were performed after in-plane ac demagnetization and stripe domains are observed, particularly for the thickest films, where the magnetocrystalline anisotropy is dominant, showing well-defined stripe patterns, inferring the weaker perpendicular anisotropies. These results, and others, are presented and discussed.
机译：我们在真空下蒸发了一系列的CO薄膜，以垂直且倾斜的入射率在硅和玻璃基板上蒸发到硅和玻璃基板上。磁性层的厚度范围为20至400nm。已经通过磁力显微镜（M.F.M.）和交替梯度场磁力计（A.F.M.）技术进行了静态磁性。研究了磁性层厚度和沉积角度的影响。结果，结果发现，对于T = 20nm，对于T = 400nm，250 OE的矫顽磁场的减少。对于倾斜蒸发的钴膜的这些H_C值大于在正常发病率下蒸发的钴膜测量的值，发现等于少量OE。还发现各向异性场的减少，从1.6 koe为20nm Co厚膜到200nm Co厚膜的0.95koe。此外，发现了随着沉积角度的增加而增加这些场。饱和磁化的容易轴线位于膜平面中，而不管衬底性质如何。在平面内交流去磁后进行MFM观察，特别是对于最厚的薄膜，磁选晶圆形是显性的，显示出明确的条纹图案，推断较弱的垂直各向异性。这些结果和其他结果是展示和讨论的。

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