Direct in situ GDD measurement in optical coating process

机译：直接原位GDD测量在光学涂层过程中

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In the presented work a fast frequency domain measurement system to determine group delay (GD) and group delay dispersion (GDD) of optical coatings is proposed. The measurements are performed in situ directly on moving substrates during the thin film coating process. The method is based on a Michelson interferometer, which is equipped with a high power broad band light source and a fast spectrometer. Especially for the production of chirped mirrors it is advantageous to obtain group delay and group delay dispersion data of the last layers. This additional information allows for online corrections of coating errors to enhance the precision of complex interference filters for short pulse applications.

机译：在所提出的工作中，提出了一种快速频率域测量系统，用于确定光学涂层的组延迟（GD）和组延迟分散（GDD）。在薄膜涂布过程期间，测量在原位上直接进行移动基板。该方法基于迈克尔逊干涉仪，其配备有高功率宽带光源和快速光谱仪。特别是对于啁啾镜的产生，有利的是获得最后一层的组延迟和组延迟分散数据。该附加信息允许在线校正涂层误差，以增强用于短脉冲应用的复杂干扰滤波器的精度。

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《Conference on Optical Systems Design 2015: Advances in optical thin films V》|2015年||共9页
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S. Schlichting; T. Willemsen; H. Ehlers; U. Morgner; D. Ristau;
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中图分类薄膜的性质;
关键词
in situ measurement; GD; GDD; FTSI; STFT; optical coatings; optical thin films; chirped mirrors;

机译：原位测量;GD;GDD;FTSI;STFT;光学涂层;光学薄膜;啁啾镜子;

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机译：光学镀膜过程中的直接原位GDD测量

Direct in situ GDD measurement in optical coating process

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