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Preparation, characterization and photopatterning of copolymer containing imidazo phenanthroline Langmuir-Blodgett films

机译:含Imidazo菲利植物Langmuir-Blodgett薄膜的共聚物的制备,表征和Photopterning

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The Langmuir- Blodgett (LB) technique makes it possible to prepare a thin film with a controlled thickness at the molecular level and a well-defined molecular orientation. It has also been studied extensively for photolithography in which it cannot only overcome the weakness of spin-coat films where molecules are distributed randomly, but also be expected to improve the resolution and the sensitivity of the resist effectively. A series of novel copolymer p (AMAc- pIPPMa) has been prepared by reactions of 1H-imidazo [4,5-f] [1,10] phenanthrolin-2-yl)phenyl methacrylate (pIPPMa) and methacrylate (AMAc). They could be formed well-ordered Langmuir monolayer at air/water interface and transferred onto substrates to form Langmuir- Blodgett (LB) films. Preliminary studies of photopatterning of LB films were carried out and the positive patterns were obtained, where a resolution of 0.75μm could be drawn. It confirmed that LB films were a fine material as resist film for photolithography.
机译:Langmuir- Blodgett(LB)技术使得可以在分子水平和明确定义的分子取向下制备具有受控厚度的薄膜。它还已经广泛地研究了光刻,其中它不能仅克服分子随机分布的旋转涂膜的弱眠,但也有效地提高了抗蚀剂的分辨率和敏感性。通过反应1H-咪唑(4,5-F] [1,10]菲丙烯酸苄酯(Pippma)和甲基丙烯酸甲酯(AMAC)反应制备一系列新型共聚物P(AMAC- PIPPMA)。它们可以在空气/水界面处形成良好的朗米尔单层,并转移到基材上以形成Langmuir- Blodgett(LB)膜。进行了LB膜的照射术的初步研究,得到了阳性图案,可以拉出0.75μm的分辨率。它证实,LB薄膜是用于光刻膜的细材料。

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