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首页> 外文会议>Energy Technologies Symposium >Comparison of Solar-Selective Absorbance Properties of TiN, TiN_xO_y, and TiO_2 Thin Films
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Comparison of Solar-Selective Absorbance Properties of TiN, TiN_xO_y, and TiO_2 Thin Films

机译：锡，TIN_XO_Y和TIO_2薄膜太阳能选择性吸光度特性的比较

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摘要

TiN, TiN_xO_y, and TiO_2 thin films share many properties such as electrical, and optical properties. In this work, a comparison is made between TiN, TiN_xO_y, and TiO_2 thin films deposited by RF magnetron sputtering (reactive sputtering) using the same pure titanium target, Argon (Ar) flow rate, nitrogen flow rates, and deposition time. In the case of TiN_xO_y thin film, oxygen is pumped in addition. TiO_2 is obtained by annealing the sputtered TiN thin films, which were subsequently annealed at 800°C for 2 h in air after sputtering. The optical properties of the thin films were characterized by a spectrophotometer, and Fourier-transform infrared spectroscopy (FTIR). The morphology and structure were studied by scanning electron microscope (SEM), atomic force microscope (AFM), and X-ray diffraction (XRD). The results show that TiN and TiN_xO_y thin films have metal-like behaviour with some similarities in structure and microstructure and differences in optical absorbance. After annealing the TiN layer, the optical absorbance of the TiO_2 is equal to 94% with a stable profile at ultraviolet, visible, and near infrared ranges.
机译：TIN，TIN_XO_Y和TIO_2薄膜共享许多属性，如电气和光学性质。在这项工作中，使用相同的纯钛靶，氩（AR）流速，氮流速和沉积时间，在锡，TiN_XO_Y和TiO_2薄膜之间进行比较，由RF磁控溅射（反应溅射）沉积（反应溅射）。在TiN_XO_Y薄膜的情况下，另外泵送氧气。通过退火溅射的锡薄膜来获得TiO_2，随后在溅射后在800℃下在800℃下退火2小时。通过分光光度计和傅里叶变换红外光谱（FTIR）的特征在于薄膜的光学性质。通过扫描电子显微镜（SEM），原子力显微镜（AFM）和X射线衍射（XRD）研究了形态和结构。结果表明，锡和锡×XY薄膜具有金属状行为，结构和微观结构的一些相似性和光学吸光度的差异。在退火后，TiO_2的光学吸光度等于94％，在紫外，可见和近红外线范围内具有稳定的曲线。

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