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首页> 外文会议>Conference on Metrology, Inspection, and Process Control for Microlithography >Diffraction signature analysis methods for improving scatterometry precision
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Diffraction signature analysis methods for improving scatterometry precision

机译：改进散射精度的衍射特征分析方法

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摘要

Scatterometry is a fast, non-destructive critical dimension (CD) optical metrology technique based on the analysis of light scattered from a periodic array of features. With technological advances in manufacturing, semiconductor devices are made in ever shrinking geometries. In recent years, the ability of scatterometry metrology tools to measure these devices at a gage-capable level for parameters such as CD, thickness or profile has become more challenging. The focus of this research is to analyze the acquired diffraction signature and determine an optimum diffraction signature "scan path." An optimized scan path can result in higher precision, reduced development time, smaller pre-generated library databases and faster real-time optimization speeds. In this work, we will first review several methods for scan path selection and optimization. Our results indicate that the method choice can influence the scan path selection, and that some of the methods are complementary to one another. For example, one method, which we term orthogonal sensitivity, uses intelligent algorithms to select optimal scan path points based on enhancing single parameter sensitivity. While the method works well, it neglects parameter correlation effects. Thus, we will also review a method where correlation effects are considered. Finally, we will calculate and summarize the effectiveness of optimal scan path selection techniques using challenging lithography applications.
机译：散射量是一种快速，非破坏性的临界尺寸（CD）光学计量技术，基于从周期性的特征阵列散射的光分析。通过制造技术进步，半导体器件是在缩小的几何形状中进行的。近年来，散射测量计量工具在诸如CD，厚度或曲线等参数的能力水平下测量这些装置的能力变得更具挑战性。本研究的重点是分析所获得的衍射签名并确定最佳衍射签名“扫描路径”。优化的扫描路径可能导致更高的精度，降低的开发时间，更小的预生成的库数据库和更快的实时优化速度。在这项工作中，我们将首先审查几种扫描路径选择和优化方法。我们的结果表明，方法选择可以影响扫描路径选择，并且一些方法彼此互补。例如，我们术语正交灵敏度的一种方法使用智能算法基于提高单个参数灵敏度来选择最佳扫描点。当该方法运行良好时，它会忽略参数相关效果。因此，我们还将审查考虑相关效果的方法。最后，我们将计算和总结使用具有挑战性的光刻应用的最佳扫描路径选择技术的有效性。

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