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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Diffraction signature analysis methods for improving scatterometry precision
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Diffraction signature analysis methods for improving scatterometry precision

机译：提高散射测量精度的衍射特征分析方法

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摘要

Scatterometry is a fast, non-destructive critical dimension (CD) optical metrology technique based on the analysis of light scattered from a periodic array of features. With technological advances in manufacturing, semiconductor devices are made in ever shrinking geometries. In recent years, the ability of scatterometry metrology tools to measure these devices at a gage-capable level for parameters such as CD, thickness or profile has become more challenging. The focus of this research is to analyze the acquired diffraction signature and determine an optimum diffraction signature "scan path." An optimized scan path can result in higher precision, reduced development time, smaller pre-generated library databases and faster real-time optimization speeds. In this work, we will first review several methods for scan path selection and optimization. Our results indicate that the method choice can influence the scan path selection, and that some of the methods are complementary to one another. For example, one method, which we term orthogonal sensitivity, uses intelligent algorithms to select optimal scan path points based on enhancing single parameter sensitivity. While the method works well, it neglects parameter correlation effects. Thus, we will also review a method where correlation effects are considered. Finally, we will calculate and summarize the effectiveness of optimal scan path selection techniques using challenging lithography applications.
机译：散射法是一种快速，无损的临界尺寸（CD）光学计量技术，它基于对从周期性特征阵列散射的光的分析。随着制造技术的进步，半导体器件的尺寸不断缩小。近年来，散射计量学工具在具有测量能力的水平上针对CD，厚度或轮廓等参数测量这些设备的能力变得越来越具有挑战性。这项研究的重点是分析获得的衍射特征并确定最佳的衍射特征“扫描路径”。优化的扫描路径可以带来更高的精度，更少的开发时间，更小的预生成库数据库以及更快的实时优化速度。在这项工作中，我们将首先回顾几种选择和优化扫描路径的方法。我们的结果表明，方法的选择会影响扫描路径的选择，并且某些方法相互补充。例如，一种称为正交灵敏度的方法使用智能算法基于增强的单参数灵敏度来选择最佳扫描路径点。尽管该方法行之有效，但却忽略了参数相关性效应。因此，我们还将回顾考虑相关效应的方法。最后，我们将使用具有挑战性的光刻应用程序来计算和总结最佳扫描路径选择技术的有效性。

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