Application of KOH Anisotropic Etching in the Fabrication of MEMS Devices

著录项

• 来源
  《International Conference of Chinese Society of Micro-Nano Technology;Annual Conference of the Chinese Society of Micro-Nano Technology》|2010年|p.62-65|共4页
• 会议地点 Xian(CN);Xian(CN)
• 作者

  Zhengguo Shang; Zhiyu Wen; Dongling Li; Shengqiang Wang;

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• 作者单位

  National Key Laboratory of Fundamental Science of Micro/Nano-Device and System Technology, Chongqing University, Chongqing, China,Microsystem Research Center of Chongqing University, Chongqing, China;

  National Key Laboratory of Fundamental Science of Micro/Nano-Device and System Technology, Chongqing University, Chongqing, China,Microsystem Research Center of Chongqing University, Chongqing, China;

  National Key Laboratory of Fundamental Science of Micro/Nano-Device and System Technology, Chongqing University, Chongqing, China,Microsystem Research Center of Chongqing University, Chongqing, China;

  National Key Laboratory of Fundamental Science of Micro/Nano-Device and System Technology, Chongqing University, Chongqing, China,Microsystem Research Center of Chongqing University, Chongqing, China;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 光学仪器;微电子学、集成电路（IC）;
• 关键词

  wet anisotropic etching; cone curvature radius; cone aspect ratio; surface roughness;

  机译：湿法各向异性蚀刻；圆锥曲率半径圆锥长宽比；表面粗糙度;