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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.1 >Calibrating Optical Overlay Measurements
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Calibrating Optical Overlay Measurements

机译：校准光学覆盖测量

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摘要

The National Institute of Standards and Technology (NIST) and The International Sematech Manufacturing Initiative (ISMI) have been involved in a project to evaluate the accuracy of optical overlay measurements in the presence of measurement target asymmetries created by typical wafer processing. The ultimate goal of this project is to produce a method of calibrating optical overlay measurements on typical logic and memory production stacks. A method of performing accurate CD-SEM and CD-AFM overlay measurements is first presented. These measurements are then compared to optical overlay measurements of the same structures to assess the accuracy of the optical measurements. Novel image rotation tests were also performed on these structures to develop a method to decouple errors from metrology target asymmetries and measurement system optical asymmetries.
机译：美国国家标准技术研究院（NIST）和国际Sematech制造计划（ISMI）参与了一个项目，该项目在存在典型晶圆加工产生的测量目标不对称性的情况下评估光学覆盖测量的准确性。该项目的最终目标是提供一种在典型逻辑和存储器生产堆栈上校准光学覆盖测量的方法。首先介绍一种执行准确的CD-SEM和CD-AFM重叠测量的方法。然后将这些测量值与相同结构的光学叠加测量值进行比较，以评估光学测量值的准确性。还对这些结构进行了新颖的图像旋转测试，以开发一种将误差与计量目标不对称性和测量系统光学不对称性分离的方法。

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