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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Critical Dimension AFM tip characterization and image reconstruction applied to the 45 nm node
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Critical Dimension AFM tip characterization and image reconstruction applied to the 45 nm node

机译：关键尺寸AFM尖端表征和图像重建应用于45 nm节点

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摘要

Three significant critical dimension atomic force microscopy (CD AFM) advances are presented in this paper. First, scanning probe image reconstruction methodologies that were formerly limited to parabolic type tip shapes and single-valued surfaces (i.e., non-reentrant topography), are extended to multi-valued surfaces and reentrant tip geometries. This crucial step allows the elimination of image artifacts associated with CD AFM scanning of complex feature shapes using reentrant tips. Second, in situ AFM tip images are provided in an automated tool that enables full image reconstruction. Consequently, for the first time, the combination of in situ tip reconstruction with the inherent reference measurement qualities of the AFM and full morphology reconstruction allow CD AFM metrology essentially free of tip shape effects. As a result, CD AFM is now primarily driven by development of tip geometries that contact the entire specimen surface while retaining adequate tip lifetime. In order to explain the importance of the present development in eliminating measurement bias, the background of CD AFM image dilation is described in detail, and the limitations of "legacy" 1D image reconstruction is examined. Initial validation of the automated software is provided by comparison with TEM micrographs. Tip characterizations are presented for a morphologically complex ～20 nm diameter carbon nanotube tip and reentrant silicon CD32 tips (tip width ～ 30nm). Finally, the capability for CD AFM to scan a reentrant sub-45 nm width trench is demonstrated. An EUV resist trench was scanned with a CD32 tip (tip width = 27.4 nm). Minimum CD ranged from 42 to 45 nm. Reentrant image reconstruction is shown for the scan cross-section.
机译：本文介绍了三种重要的临界尺寸原子力显微镜技术（CD AFM）。首先，以前限于抛物线型尖端形状和单值表面（即非凹入形貌）的扫描探针图像重建方法已扩展到多值表面和凹入尖端几何形状。这一关键步骤可以消除与使用可重入尖端的复杂特征形状的CD AFM扫描相关的图像伪影。第二，在自动工具中提供原位AFM尖端图像，该图像可实现完整图像重建。因此，首次将原位笔尖重建与AFM固有的参考测量质量以及完全形态重建相结合，使CD AFM计量学基本上没有笔尖形状影响。结果，CD AFM现在主要由尖端几何形状的发展驱动，该尖端几何形状接触整个样本表面，同时保留足够的尖端寿命。为了解释本发明在消除测量偏差中的重要性，详细描述了CD AFM图像扩张的背景，并研究了“传统”一维图像重建的局限性。通过与TEM显微照片进行比较，可以对自动化软件进行初步验证。给出了形态学上复杂的直径约20 nm的碳纳米管尖端和可重入的硅CD32尖端（尖端宽度〜30nm）的尖端特征。最后，展示了CD AFM扫描可重入的45 nm以下沟槽的能力。用CD32尖端（尖端宽度= 27.4 nm）扫描EUV抗蚀剂沟槽。最小CD范围为42至45 nm。显示了扫描截面的折返图像重建。

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