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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Image resolution monitoring technique for CD-SEM
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Image resolution monitoring technique for CD-SEM

机译：CD-SEM图像分辨率监控技术

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摘要

This report presents a technique for quantifying the differences in resolution between tools from the SEM images at sub-nanometer scales. The accuracy of resolution monitoring of SEM images depends on the image noise factor and the sample shape factor. Therefore, a resolution monitoring method that is less dependent on the noise and the sample shape is highly desirable. In this study, the dependence on random noise and changes in sample shape are evaluated for three existing resolution measurement methods: the contrast-to-gradient (CG), fast Fourier transform (FFT) and auto correlation function (ACF) methods. By analyzing simulated and experimental SEM images, it was found that the CG method was the least dependent on noise and the sample, while the other two methods exhibited larger variations between samples. On the basis of these benchmarking results, the CG method appears to exhibit the best performance out of these existing resolution measurement techniques.
机译：该报告提出了一种技术，可用于以亚纳米尺度对来自SEM图像的工具之间的分辨率差异进行量化。 SEM图像分辨率监控的精度取决于图像噪声因子和样本形状因子。因此，非常需要一种对噪声和样本形状的依赖性较小的分辨率监视方法。在这项研究中，使用三种现有的分辨率测量方法评估了对随机噪声和样本形状变化的依赖性：对比度到梯度（CG），快速傅里叶变换（FFT）和自动相关函数（ACF）方法。通过对模拟和实验SEM图像进行分析，发现CG方法对噪声和样品的依赖性最小，而其他两种方法在样品之间的差异较大。根据这些基准测试结果，CG方法似乎表现出了这些现有分辨率测量技术中的最佳性能。

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