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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Overlay Improvement by Non-linear Error Correction and Non-linear Error Control by APC
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Overlay Improvement by Non-linear Error Correction and Non-linear Error Control by APC

机译：通过APC进行非线性误差校正和非线性误差控制来改善覆盖

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The continuing downscale of semiconductor fabrication ground rule requires increasingly tighter overlay tolerances, which becomes very challenging at the cutting-edge lithographic node. We need to keep improving overlay performance to admit the requirements of tight overlay budget. The conventional method of overlay control is controlling linear model parameters during alignment and process correction by APC for linear errors after alignment. Due to this kind of control for linear parameters, this linear error proportion out of total overlay error can be the indicator how well the overlay is being controlled by the conventional overlay control method. After achieving this small proportion of linear error, normally 10 parameters, out of total overlay errors, this conventional method of overlay control face the limitation of improvement and this implies us that it is necessary to work on non-linear overlay error for further improvement. Initial investigation starts from finding out contribution of grid and field for the remained error after 10 parameter linear modeling and the result shows up higher contribution from grid factor. The way to break down grid residual error is by method of control. Nikon provided GCM function which has some options to deal with these non-linear errors, so we tested and simulated a couple of new methods of overlay control to improve the other proportion of total overlay error beside linear overlay error. 1st approach for further improvement was remaining x,y offset feedback through APC for each field after linear modeling and 2nd was non-linear alignment and 3rd is the combination of both methods.This paper will explain which method will improve which part of overlay errors and the test or simulated results of improvement.
机译：半导体制造基本规则的持续缩小要求覆盖公差越来越严格，这在尖端光刻节点上变得非常具有挑战性。我们需要不断提高重叠广告的性能，以适应紧张的重叠广告预算的要求。叠加控制的常规方法是在对齐过程中控制线性模型参数，并通过APC对对齐后的线性误差进行过程校正。由于这种对线性参数的控制，在总覆盖误差中所占的线性误差比例可以指示常规覆盖控制方法对覆盖的控制程度。在实现了总覆盖误差中很小比例的线性误差（通常为10个参数）之后，这种传统的覆盖控制方法面临着改进的局限，这意味着我们有必要对非线性覆盖误差进行进一步改进。最初的研究从找出10个参数线性建模后剩余误差的网格和场的贡献开始，结果表明网格因数的贡献更大。消除网格残留误差的方法是通过控制方法。尼康提供了GCM功能，该功能具有处理这些非线性误差的一些选项，因此我们测试并模拟了两种新的叠加控制方法，以改善除线性叠加误差外总叠加误差的其他比例。进一步改进的第一种方法是在线性建模后通过APC在每个场上保留x，y偏移反馈，第二种是非线性对齐，第三种是两种方法的组合。本文将说明哪种方法将改善重叠误差的哪一部分以及测试或模拟结果的改进。

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