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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >An Integrated Solution for Photomask Manufacturing, Handling and Storage at 65nm and Below
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An Integrated Solution for Photomask Manufacturing, Handling and Storage at 65nm and Below

机译：适用于65nm及以下波长的光掩模制造，处理和存储的集成解决方案

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摘要

As reticle line widths shrink and RET complexity increases, even a single sub-micron defect can reject a photomask. High-end reticle manufacturers striving for increased yield and reduced cycle times are relying on low incoming rawstock defect levels and handling via SMIF mini environments for critical manufacturing steps. However, even in SMIF compatible reticle fabs, human handling is often required to load or unload a reticle to/from a SMIF environment. In an effort to provide a fully integrated solution to manufacturing 65 nm and below photomasks, Photronics has introduced a blank inspection/management system developed by Hitachi High Technologies and Fortrend Engineering. The clustered system is capable of robotic transfers in conjunction with blank storage, inspection, and material tracking capabilities. It consists of four major systems: a horizontal mask blank transfer system with state-of-the-art blank sorting capability, an integrated Hitachi GM3000 Mask Blank Surface Inspection System, a totally self-contained and sufficient Mask Blank Storage Station, and a material logistic control software system for material management and SPC. The Fortrend Lamina sorting system has a bright light inspection module for gross particle contamination detection, and a robotic transfer module for mask exchanges between SMIF and other shipping/transport boxes employed in the mask manufacturing facilities. The clustered Hitachi inspection system is an integral part of the solution allowing for additional inspections of stored and incoming blanks by optically detecting foreign particles and pinholes. The data is transferred and stored in the Foretrend handling system control module and may be used for rawstock management and screening based on a predefined criteria. The integrated system provides a total solution to mask manufacturing challenges at 65 nm and below.
机译：随着标线线宽的缩小和RET复杂度的增加，即使是单个亚微米缺陷也可以拒绝光掩模。力争提高产量和减少周期时间的高端光罩制造商正在依靠较低的原料缺陷水平，并通过SMIF mini环境进行关键制造步骤的处理。但是，即使在兼容SMIF的标线晶圆厂中，通常也需要人工操作才能将标线加载到SMIF环境或从中卸载标线。为了提供用于制造65 nm及以下波长的光掩模的完全集成解决方案，Photronics引入了由Hitachi High Technologies和Fortrend Engineering开发的空白检查/管理系统。集群系统能够结合空白存储，检查和物料跟踪功能进行自动传输。它由四个主要系统组成：具有最新毛坯分拣功能的水平毛坯毛坯传输系统，集成的Hitachi GM3000毛坯毛坯表面检测系统，完全独立且足够的毛坯毛坯存储站以及材料用于物料管理和SPC的物流控制软件系统。 Fortrend Lamina分拣系统具有用于检测总颗粒污染的强光检查模块，以及用于在SMIF与口罩制造设施中使用的其他运输/运输箱之间进行口罩更换的机器人转移模块。日立的集群式检查系统是该解决方案不可或缺的一部分，它可以通过光学检测异物和针孔来对存储和进入的毛坯进行额外的检查。数据被传输并存储在Foretrend处理系统控制模块中，并可根据预定义的标准用于原料管理和筛选。集成系统提供了一个完整的解决方案来应对65 nm及以下的制造挑战。

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