首页> 外文会议>Microelectronics Technology and Devices-SBMicro 2008 >LINEARITY ANALYSIS IN DOUBLE GATE GRADED-CHANNEL SOI DEVICES APPLIED TO 2-MOS MOSFET-C BALANCED STRUCTURES
【24h】

LINEARITY ANALYSIS IN DOUBLE GATE GRADED-CHANNEL SOI DEVICES APPLIED TO 2-MOS MOSFET-C BALANCED STRUCTURES

机译:适用于2 MOS MOSFET-C平衡结构的双门梯度通道SOI设备中的线性分析

获取原文
获取原文并翻译 | 示例

摘要

This paper examines the linearity of 2-MOS MOSFET-C balanced structures using conventional and Graded-Channel (GC) Gate-All-Around (GAA) devices. The distortion analysis has been performed through the evaluation of third order harmonic distortion (HD3). The study has been carried out through experimental results, two-dimensional process and device simulations. Along this work, the best operation bias in terms of HD3 is determined for each analysed device and the couple device that exhibits lower HD3 is pointed out. The use of GC GAA devices in 2-MOS structures has showed to improve the linearity in relation to the conventional GAA. Finally, a discussion over the non-linearities causes is performed clarifying their origins and the improvement provided by the adoption of GC GAA devices in 2-MOS structures.
机译:本文研究了使用常规通道和渐变通道(GC)全方位栅极(GAA)器件的2-MOS MOSFET-C平衡结构的线性。通过评估三阶谐波失真(HD3)进行了失真分析。该研究是通过实验结果,二维过程和设备仿真进行的。通过这项工作,为每个被分析的设备确定了以HD3表示的最佳操作偏差,并指出了具有较低HD3的耦合设备。与传统的GAA相比,在2-MOS结构中使用GC GAA器件已显示出可改善线性度。最后,对非线性原因进行了讨论,以阐明其起源以及在2-MOS结构中采用GC GAA器件所提供的改进。

著录项

  • 来源
  • 会议地点 Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR)
  • 作者单位

    LSI/PSI/USP, University of Sao Paulo Av. Prof. Luciano Gualberto, trav.3 n.158, 05508-900 - Sao Paulo, Brazil;

    Seccion de Electronica del Estado Solido (SEES), CINVESTAV Av. IPN No. 2508, Apto. Postal 14-740, 07300 DF, Mexico;

    Laboratoire d'Hyperfrequences lace du Levant 3, Maxwell Building, B-1348 Louvain-la-Neuve, Belgium;

    Laboratoire de Microelectronique, Universite Catholique de Louvain Place du Levant 3, Maxwell Building, B-1348 Louvain-la-Neuve, Belgium;

    LSI/PSI/USP, University of Sao Paulo Av. Prof. Luciano Gualberto, trav.3 n.158, 05508-900 - Sao Paulo, Brazil Electrical Engineering Department, Centro Universitario da FEI Av. Humberto de A. Castelo Branco, 3972, 09850-901 - Sao Bernardo do Campo, Brazil;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 微电子学、集成电路(IC);
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号