ETCHING CHARACTERISTICS AND SURFACE MORPHOLOGY OF NITROGEN-DOPED a-SiC FILMS PREPARED BY RF MAGNETRON SPUTTERING

著录项

• 来源
  《Microelectronics Technology and Devices-SBMicro 2008》|2008年|375-384|共10页
• 会议地点 Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR)
• 作者

  M. A. Fraga; R. S. Pessoa; I. C. Oliveira; M. Massi; H. S. Maciel; H. S. Martinho; S. G. dos Santos Filho; J. S. Marcuzzo;

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• 作者单位

  Plasmas and Processes Laboratory - Department of Physics, Technological Institute of Aeronautics, S.J. Campos, Brazil;

  Plasmas and Processes Laboratory - Department of Physics, Technological Institute of Aeronautics, S.J. Campos, Brazil;

  Plasmas and Processes Laboratory - Department of Physics, Technological Institute of Aeronautics, S.J. Campos, Brazil;

  Plasmas and Processes Laboratory - Department of Physics, Technological Institute of Aeronautics, S.J. Campos, Brazil;

  Plasmas and Processes Laboratory - Department of Physics, Technological Institute of Aeronautics, S.J. Campos, Brazil;

  Federal University of ABC, UFABC, Santo Andre, Brazil;

  University of Sao Paulo, LSI /EPUSP, Brazil;

  Plasmas and Processes Laboratory - Department of Physics, Technological Institute of Aeronautics, S.J. Campos, B;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 微电子学、集成电路（IC）;
• 关键词