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Ni-electroplating of double-width micro-cantilever

机译:双宽度微悬臂梁的镍电镀

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Micro-electroplating technology has an increasingly wider application in the fabrication of MEMS devices. In order to fabricate a double-width cantilever beam which has three different electroplated areas. The proper composition of the bath solution is obtained through experiments firstly in the paper. Then the effects of the peak of current density, duty cycle and pause time on the surface morphology of the electroplated nickel are studied experimentally to make sure the regulating range of pulsed parameters. And at last the double-width cantilever beam is fabricated using lithographic, micro-electroplating and sacrificial layer releasing processes. The results show that the surface of the beam is bright and smooth, and the nucleation rate increases steadily. But the thickness of the three parts with different width is different which can be modified by increasing the duty cycle and reducing the current density to some extent.
机译:微电镀技术在MEMS器件的制造中具有越来越广泛的应用。为了制造具有三个不同电镀区域的双宽度悬臂梁。本文首先通过实验获得了浴液的合适组成。然后通过实验研究电流密度,占空比和停顿时间的峰值对电镀镍表面形貌的影响,以确保脉冲参数的调节范围。最后,使用光刻,微电镀和牺牲层释放工艺制造了双倍宽度的悬臂梁。结果表明,光束表面光洁光滑,成核率稳定增加。但是,具有不同宽度的三个部分的厚度是不同的,可以通过增加占空比并在一定程度上降低电流密度来进行修改。

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