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Depth sensitive Fourier-Scatterometry for the characterization of sub-100 nm periodic structures

机译:深度敏感的傅里叶散射法用于表征100 nm以下的周期性结构

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Recently Fourier-Scatterometry has become of increasing interest for quantitative wafer metrology. But also in other fields the fast and precise optical characterization of periodical gratings of sub 100 nm size is of great interest. We present the application of Fourier-Scatterometry, extended by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. First a simulation-based sensitivity comparison of Fourier-Scatterometry at one fixed wavelength, Fourier-Scatterometry using a white light light source and also additionally using a reference-branch for white-light-interference has been carried out. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. The simulations were performed using the rigorous-coupled-waveanalysis included in our software package MicroSim. A sensitivity comparison between both methods is presented for the mentioned structure types. We also show our experimental implementation of the measurement setup using a whitelight- laser and a modified microscope with a high-NA (NA: 0.95) objective as well as a Linnik-type reference branch for the phase sensitive measurements. First measurements for the investigation of the performance of this measurement setup are presented for comparison with the simulation results.
机译:近来,傅里叶散射测定法已对定量晶片计量引起越来越多的关注。但是在其他领域,亚微米尺寸的100 nm以下周期性光栅的快速精确光学表征也引起了人们的极大兴趣。我们提出了傅里叶散射法的应用,并扩展了对白光相干特性的利用,以表征由双光子聚合构成的光敏材料的亚波长周期性光栅。首先,已经进行了基于模拟的在一个固定波长处的傅里叶散射灵敏度比较,使用白光源的傅里叶散射灵敏度测试以及还使用参考分支进行白光干涉的灵敏度比较。研究的结构包括由光敏材料的双光子聚合产生的光栅和典型的半导体测试光栅。使用我们的软件包MicroSim中包含的严格耦合波分析进行了仿真。针对上述结构类型,介绍了两种方法之间的灵敏度比较。我们还展示了使用白光激光器和改进的具有高NA(NA:0.95)物镜的显微镜以及用于相敏测量的Linnik型参考分支的测量设置的实验实现。提出了用于调查此测量设置性能的第一个测量结果,以便与仿真结果进行比较。

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