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Enhanced thermoelectric properties of Al-doped ZnO thin films

机译:铝掺杂ZnO薄膜的增强的热电性能

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摘要

We have prepared 2% Al doped ZnO (AZO) thin films on SrTiO_3 and Al_2O_3 substrates by Pulsed Laser Deposition (PLD) technique at various deposition temperatures (T_(dep) = 300 ℃ -600 ℃). Transport and thermoelectric properties of AZO thin films were studied in low temperature range (300 K - 600 K). AZO/STO films present superior performance respect to AZO/Al_2O_3 films deposited at the same temperature, except for films deposited at 400 ℃. Best film is the fully c-axis oriented AZO/STO deposited at 300 ℃, with electrical conductivity 310 S/cm, Seebeck coefficient -65 μV/K and power factor 0.13 × 10~(-3) Wm~(-1)K~(-2) at 300 K. Its performance increases with temperature. For instance, power factor is enhanced up to × 10~(-3) Wm~(-1)K~(-2) at 600 K, surpassing the best AZO film previously reported in literature.
机译:我们在不同的沉积温度(T_(dep)= 300℃-600℃)下通过脉冲激光沉积(PLD)技术在SrTiO_3和Al_2O_3衬底上制备了2%的Al掺杂ZnO(AZO)薄膜。在低温范围(300 K-600 K)下研究了AZO薄膜的传输和热电性能。与在相同温度下沉积的AZO / Al_2O_3膜相比,AZO / STO膜具有更好的性能,但在400℃下沉积的膜除外。最好的薄膜是在300℃下沉积的全c轴取向的AZO / STO,电导率为310 S / cm,塞贝克系数为-65μV/ K,功率因数为0.13×10〜(-3)Wm〜(-1)K 〜(-2)在300 K时。其性能随温度而增加。例如,在600 K时,功率因数提高到×10〜(-3)Wm〜(-1)K〜(-2),超过了先前文献中报道的最佳AZO膜。

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  • 会议地点 San Francisco CA(US)
  • 作者单位

    Hiroshima University, Institute for Sustainable Sciences and Development, 739-8530 Higashi-Hiroshima, Japan;

    Hiroshima University, Institute for Sustainable Sciences and Development, 739-8530 Higashi-Hiroshima, Japan;

    Hiroshima University, Graduate School for Advanced Sciences of Matter, 739-8530 Higashi-Hiroshima, Japan;

    Hiroshima University, Graduate School for Advanced Sciences of Matter, 739-8530 Higashi-Hiroshima, Japan;

    Kyushu Institute of Technology, Department of Material Science, 804-8550 Kitakyushu, Japan;

    Kyushu Institute of Technology, Department of Mechanical Engineering, 804-8550 Kitakyushu,Japan;

    Kyushu Institute of Technology, Department of Mechanical Engineering, 804-8550 Kitakyushu,Japan;

    CRIEPI, Electric Power Engineering Research Laboratory, 240-0196 Yokosuka, Japan;

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