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DEEP TRAP CHARACTERIZATION IN GaN USING THERMAL AND OPTICAL ADMITTANCE SPECTROSCOPY

机译:利用热和光导谱法对GaN中的深陷阱进行表征

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摘要

Deep defect levels and the optical as well as thermal transitions of carriers from the levels into the corresponding bands were analyzed using Thermal and Optical Admittance Spectroscopy. High resistivity GaN-layers grown by MBE and heterostructures consisting of n-type GaN-layers grown with Low Pressure Chemical Vapor Deposition on 6H-SiC substrates are investigated. In the MBE-grown GaN layers we determine deep electron traps with thermal activation energies of E_A=(0.45±0.04)eV and E_A=(0.65±0.03)eV. Furthermore, three different kinds of optical transitions were distinguished by Optical Admittance Spectroscopy: near band gap transitions including the transition between the valence band and a shallow donor 50meV below the conduction band, a peak at 2. leV associated with the yellow photoluminescence band and various deep level-band transitions in the infrared region.rnThe high sensitivity of the TAS to interface defect states was used to investigate GaN/SiC heterostructures. We found an interface defect state at 70 ... 90meV. Furthermore, one level was obtained originating from the epitaxial GaN-layer having an activation energy of 63±3meV. A defect distribution was identified in the p-type SiC-substrate with activation energies between 160 meV and 180meV.
机译:使用热导率和光学导纳谱分析了深缺陷水平以及载流子从水平到相应谱带的光学和热跃迁。研究了通过MBE生长的高电阻率GaN层以及在6H-SiC衬底上由低压化学气相沉积生长的n型GaN层组成的异质结构。在MBE生长的GaN层中,我们确定了深电子陷阱,其热活化能为E_A =(0.45±0.04)eV和E_A =(0.65±0.03)eV。此外,通过光学导纳光谱法可以区分三种不同类型的光学跃迁:近带隙跃迁,包括价带和导带以下50meV的浅施主之间的跃迁,2.leV的峰(与黄色光致发光带相关)以及各种TAS对界面缺陷状态的高灵敏度被用于研究GaN / SiC异质结构。我们发现接口缺陷状态为70 ... 90meV。此外,从具有63±3meV的活化能的外延GaN层获得一个能级。在激活能量在160meV和180meV之间的p型SiC衬底中发现了缺陷分布。

著录项

  • 来源
    《Nitride semiconductors》|1997年|887-892|共6页
  • 会议地点 Boston MA(US)
  • 作者单位

    Institute of Experimental Physics, University of Magdeburg, PO Box 4120, 39016 Magdeburg;

    Institute of Experimental Physics, University of Magdeburg, PO Box 4120, 39016 Magdeburg;

    Institute of Experimental Physics, University of Magdeburg, PO Box 4120, 39016 Magdeburg;

    Institute of Experimental Physics, University of Magdeburg, PO Box 4120, 39016 Magdeburg;

    Institute of Solid State Physics, University of Bremen, PO Box 330440, 28334 Bremen;

    Institute of Solid State Physics, University of Bremen, PO Box 330440, 28334 Bremen;

    Institute of Solid State Physics, University of Bremen, PO Box 330440, 28334 Bremen;

    1. Institute of Physics, University of Giessen, Heinrich Buff Ring 16, 35392 Giessen;

    1. Institute of Physics, University of Giessen, Heinrich Buff Ring 16, 35392 Giessen;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
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