Polarization aberration function for perturbed lithographic lens

著录项

• 来源
  《Optical design and testing VI》|2014年|92720G.1-92720G.15|共15页
• 会议地点 Beijing(CN)
• 作者

  Wei Huang; Xiangru Xu; Mingfei Xu; Weicai Xu; Zhaoxin Tang;

  展开▼
• 作者单位

  Changchun Institute of Optics, Fine Mechanics and Physic, Chinese Academy of Sciences, Changchun, Jilin 130033, China,State Key Laboratory of Applied Optics, Changchun, Jilin 130033, China;

  Changchun Institute of Optics, Fine Mechanics and Physic, Chinese Academy of Sciences, Changchun, Jilin 130033, China,University of Chinese Academy of Sciences, Beijing 100039, China;

  Changchun Institute of Optics, Fine Mechanics and Physic, Chinese Academy of Sciences, Changchun, Jilin 130033, China,University of Chinese Academy of Sciences, Beijing 100039, China;

  Changchun Institute of Optics, Fine Mechanics and Physic, Chinese Academy of Sciences, Changchun, Jilin 130033, China,State Key Laboratory of Applied Optics, Changchun, Jilin 130033, China;

  Changchun Institute of Optics, Fine Mechanics and Physic, Chinese Academy of Sciences, Changchun, Jilin 130033, China,University of Chinese Academy of Sciences, Beijing 100039, China;

  展开▼
• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  polarization aberration function; high NA lithographic lens; Jones matrix; field-Zernike polynomials; field-orientation Zernike polynomials;

  机译：偏振像差函数高NA平版印刷镜头；琼斯矩阵；场-泽尼克多项式场定向Zernike多项式;