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首页> 外文期刊>Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter >High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix
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High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix

机译：基于二进制目标和旋转回归矩阵的高阶波前像差测量方法

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摘要

A high-order wavefront aberration (HWA) measurement method for a hyper-NA lithographic projection lens based on a binary target with eight directions and rotated regression matrix is proposed. A linear model between the aerial image intensity distribution of the hyper-NA lithographic projection lens and HWAs is built by principal component analysis and regression matrix rotation. Compared to the conventional method using a binary target with six directions, the proposed method improves the efficiency of pupil sampling, increases the modeling speed, extends the measuring range of the wavefront aberrations, and detects the HWAs of the hyper-NA lithographic projection lens accurately. The lithographic simulator PROLITH is used to validate the accuracies of the HWA measurement and analyze the impact of the illumination types of source on the accuracy of the HWA measurement, as well as the polarization rotation of illumination, the sample interval of the aerial images, and the manufacturing error of the test target. The results show that the proposed method retrieves 60 terms of Zernike coefficients (Z(5)-Z(64)) with measurement accuracy greater than 1.03x10(-3)lambda.
机译：提出了一种基于具有八个方向和旋转回归矩阵的二进制目标的超级光谱投影透镜的高阶波前像差（HWA）测量方法。通过主成分分析和回归矩阵旋转构建了超基光刻投影镜头和HWA的空中图像强度分布之间的线性模型。相比于使用具有六个方向的二进制目标的传统方法，该方法提高光瞳采样的效率，增加了建模速度，延长了波前像差的测量范围，并准确地检测该超NA光刻投影透镜的HWAS 。光刻模拟器PROLITH用于验证的HWA测量的准确度，并分析该照明类型的HWA测量的精度源的影响，以及照明的偏振旋转，所述空间图像的采样间隔，并测试目标的制造错误。结果表明，该方法检索Zernike系数的60个Zernike系数（Z（5）-Z（64）），测量精度大于1.03x10（-3）λ。

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