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Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image

机译：基于航空影像主成分分析的超NA光刻投影镜头波前像差测量方法

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摘要

A wavefront aberration measurement method for a hyper-NA lithographic projection lens by use of an aerial image based on principal component analysis is proposed. Aerial images of the hyper-NA lithographic projection lens are expressed accurately by using polarized light and a vector imaging model, as well as by considering the polarization properties. As a result, the wavefront aberrations of the hyper-NA lithographic projection lens are measured accurately. The lithographic simulator PROLITH is used to validate the accuracies of the wavefront aberration measurement and analyze the impact of the polarization rotation of illumination on the accuracy of the wavefront aberration measurement, as well as the degree of polarized light and the sample interval of aerial images. The result shows that the proposed method can retrieve 33 terms of Zernike coefficients (Z(5) - Z(37)) with a maximum error of less than 0.00085 lambda. (C) 2016 Optical Society of America
机译：提出了一种基于主成分分析的航空影像超NA光刻投影透镜的波前像差测量方法。通过使用偏振光和矢量成像模型，以及考虑到偏振特性，可以准确地表示出超NA光刻投影镜头的航拍图像。结果，可以精确地测量hyper-NA光刻投影透镜的波前像差。光刻模拟器PROLITH用于验证波前像差测量的准确性，并分析照明的偏振旋转对波前像差测量的准确性以及偏振光的程度和航拍图像的采样间隔的影响。结果表明，该方法可以检索到33个Zernike系数（Z（5）-Z（37）），最大误差小于0.00085λ。 （C）2016美国眼镜学会

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