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首页> 外文会议>Optical Materials in Defence Systems Technology >Microdomains control in quasi-stoichiometric LiNbO_3 wafers
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Microdomains control in quasi-stoichiometric LiNbO_3 wafers

机译：准化学计量LiNbO_3晶圆中的微区控制

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In this work is presented a study on the surface microdomain formation in quasi-SLN Z-cut 3" crystals, with an accurate control on both the composition and on the wafering process. The UV absorption edge has been measured and correlated with the crystal composition, showing the edge shift towards shorter wavelengths. The coercive field has been measured as a function of temperature and it has been found lower in the quasi-SLN substrate if compared with the congruent crystals. The microdomain formation at wafer level can be controlled and avoided by appropriate composition choice as well as wafer mechanical and thermal treatments, and is checked by chemical etching and subsequent optical inspection. It has been found that quasi-SLN crystals with 49.82 Li_2O mol% content could present microdomains formation even after the photoresist process. On the other side, quasi-SLN crystals with 49.72 Li_2O mol% content seem to be more stable for both photoresist and Ti diffusion process for waveguide fabrication. A careful control on LiNbO_3 composition and wafer surface quality allows one to find the proper compositional window for the realization of various advanced optical and electro-optical devices.
机译：在这项工作中，我们对准SLN Z切3英寸晶体的表面微区形成进行了研究，并精确控制了成分和晶片加工过程。测量了UV吸收边缘并将其与晶体成分相关联结果表明，矫顽力是温度的函数，与准晶体相比，准SLN衬底中的矫顽力更低，可以控制和避免晶片级微区的形成通过适当的成分选择以及晶片的机械和热处理，并通过化学蚀刻和随后的光学检查进行检查，发现即使在光致抗蚀剂处理之后，具有49.82 Li_2O mol％含量的准SLN晶体也可能会形成微区。另一方面，Li_2O mol％含量为49.72的准SLN晶体对于光致抗蚀剂和波扩散的Ti扩散过程似乎都更稳定ide制造。对LiNbO_3成分和晶圆表面质量的仔细控制使人们能够找到合适的成分窗口，以实现各种先进的光学和光电设备。

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